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2009-04-28 'First' 22nm SRAM cells from EUV litho debut
IMEC has presented what it claims is to be the first functional 22nm CMOS SRAM cells made using extreme UV (EUV) lithography. The SRAM cells are made with FinFETs and have both the contact and metal-1 layer printed using a full-field EUV alpha demo tool from ASML.
2009-01-27 $1B capex club finds fewer members
In the midst of a major IC downturn, the "$1 billion club" for semiconductor capital spending is expected to see only five members in 2009, down from nine players in 2008, says IC Insights.
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