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2006-11-01 Tool reduces need for immersion at 45nm
Invarium Inc. offers patterning-synthesis software promising, among other things, to limit the number of advanced layers that will require immersion at 45nm. This will allow customers to get more mileage out of existing lithography equipment.
2006-09-20 Tool limits need for immersion lithography at 45nm
Invarium will roll out new patterning-synthesis software this week, promising, among other things, to limit the number of advanced layers that will require immersion at 45nm.
2006-02-14 New patterning synthesis solution for 65/45nm
Invarium unveiled DimensionPPC, a unified, full-chip process and proximity compensation product for patterning IC layouts at 65nm and below.
2007-07-17 Cadence acquires pattern-synthesis tech developer
Cadence Design Systems has acquired Invarium, a developer of advanced lithography-modeling and pattern-synthesis technology.
2007-02-16 EDA growth to continue this year
The EDA industry grew faster than expected in 2006 and is up for another good year, thanks to a healthy IC industry, an insatiable CE market and a move to 65nm and 45nm technologies.
2006-04-03 Easier OPC is tools' promise
Aprio Technologies and Brion Technologies recently launched optical proximity correction tools that promise greater accuracy and flexible user controllability.
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