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2003-03-26 JMAR, Collimated Plasma win sensor system contract
JMAR Technologies Inc. and Collimated Plasma Lithography systems have received a contract from FemtoTrace Inc. to design, develop and manufacture a line of advanced environmental sensors based on Reversal Electron Attachment Detection technology.
2003-02-10 JMAR streamlines lithography operations
JMAR Technologies Inc. will restructure and streamline its operations in order to improve profitability and better support the commercialization of its CPL semiconductor manufacturing systems and related technologies.
2002-02-15 JMAR receives letter of intent for point source system
JMAR Technologies Inc.'s JMAR Research Inc. division has received a letter of intent from the Department of the Army to execute a formal contract to be funded by the Defense Advanced Research Projects Agency worth $34.5-million.
2002-06-25 JMAR receives funding for plasma lithography systems
JMAR Technologies Inc. has received a contract from the U.S. Army Robert Morris Acquisition Center to finance the completion of its integrated proprietary point-source laser plasma lithography systems.
2002-08-13 JMAR contracts MIT for its lithography program
JMAR Technologies Inc. has initiated a contractual collaboration with MIT Prof. Henry I. Smith as part of its advanced semiconductor lithography program.
2002-07-10 JMAR announces breakthrough in lithography technology
JMAR Technologies Inc. is using "Collimated Plasma Lithography" to more accurately describe its breakthrough technology for processing higher performance silicon and GaAs chips.
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