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2002-04-26 TSMC to use KLA-Tencor test systems for its Fab 12
Taiwan Semiconductor Mfg Co. (TSMC) has selected KLA-Tencor Corp.'s Klarity Defect automated analysis and defect data management system for its Fab 12, which manufactures advanced ICs on 300mm wafers.
2003-05-29 Tower Semi deploys KLA-Tencor solution at Israel fab
Tower Semiconductor Ltd has selected KLA-Tencor Corp.'s yield-analysis software to be installed at its Fab 2 facility in Israel.
2003-11-26 Soitec, KLA-Tencor team to enhance SOI wafer technology
Soitec and KLA-Tencor have announced a joint program aimed to improve the quality and cost of production of SOI wafers used in low-power consumption IC apps.
2003-03-24 Samsung deploys KLA-Tencor system for sub-130nm processes
Samsung Electronics Co. Ltd has purchased a 300mm optical thin-film metrology tool from KLA-Tencor Corp.
2008-07-08 Report: KLA-Tencor, Lam trim workforce
Fab-tool vendors, KLA-Tencor Corp. and Lam Research Corp. have separately implemented layoffs, according to reports.
2015-10-27 Lam Research, KLA-Tencor deal raises some questions
Lam Research's proposed $10.6 billion acquisition of KLA-Tencor is generally getting a thumbs up from analysts as one of the good deals amid this year's flood of semiconductor mergers.
2004-09-03 KLA-Tencor, SIINT to bring surface metrology solution
KLA-Tencor Corp. and SII NanoTechnology (SIINT), a subsidiary of Seiko Instruments, have formed a partnership to distribute SIINT's Nanopics 2100 high-speed, high-resolution atomic force profilometer to markets outside of Japan.
2003-09-05 KLA-Tencor, Carl Zeiss team on 90nm photomasks
KLA-Tencor and Carl Zeiss Microelectronic Systems have established an alliance to help the semiconductor industry reduce costs and speed time-to-market on next-gen photomasks.
2005-07-27 KLA-Tencor, Aprio collaborate on advanced mask design tools
KLA-Tencor and Aprio Technologies, a DFM solutions provider, revealed their intent to collaborate on the development of an integrated advanced mask design inspection and repair tool.
2002-05-22 KLA-Tencor Web-based lithography speeds production
KLA-Tencor Corp. has announced the availability of the Web-based Process Window Monitor (PWM) series of lithography systems that enables tighter critical dimension control and is aimed to accelerate the volume production of sub-130nm devices.
2003-06-30 KLA-Tencor wafer monitor provides accurate feedback
KLA-Tencor has expanded its Archer overlay metrology tool series with the release of the MPX focus-exposure product.
2006-02-17 KLA-Tencor unveils latest-gen optical CD metrology system
KLA-Tencor's latest-generation optical CD metrology system provides cost-effective inline CD and profile measurements of critical device structures that help enable early prediction of IC performance and yield at the 90nm and 65nm nodes.
2007-01-10 KLA-Tencor to buy Therma-Wave for $75M
Therma-Wave Inc. said that KLA-Tencor has agreed to acquire Therma-Wave through a cash tender offer for $1.65 per share, or approximately $75 million.
2008-08-06 KLA-Tencor to buy microelectronic biz of Vistec
KLA-Tencor has entered into an agreement to acquire the Microelectronic Inspection Equipment business unit of Vistec Semiconductor Systems.
2002-06-10 KLA-Tencor rolls system for gate dielectric processes
KLA-Tencor Corp. has introduced Quantox XP, its next-generation, non-contact, in-line electrical monitoring and characterization system for controlling advanced gate dielectric processes at 130nm and below nodes.
2003-07-07 KLA-Tencor removes airborne contamination effects
KLA-Tencor's SpectraFx 100 is an optical thin-film measurement system that eliminates the effects of AMC on film measurement.
2003-05-28 KLA-Tencor PWQ accelerates reticle design verification
The Process Window Qualification of KLA-Tencor is claimed to be the industry's first solution for sub-100nm design lithographers.
2004-07-06 KLA-Tencor offering delivers surface planarity process control
KLA-Tencor unveiled what it claims as the first true line monitoring solution for trench depth and surface planarity process control based on AFM.
2003-09-17 KLA-Tencor metrology tool provides in-line monitoring
KLA-Tencor has introduced what it claims is the industry's first in-line, non-contact metal films metrology system to provide independent measurements.
2002-06-26 KLA-Tencor metrology tool features wafer monitoring
KLA-Tencor Corp. has introduced the SpectraFx 100, its fifth-generation optical thin-film metrology system, which enables product wafer monitoring for 193nm DUV lithography and copper interconnect processes.
2002-12-05 KLA-Tencor metrology tool drives down 100nm costs
KLA-Tencor Corp.'s NanoPro NP1 metrology tool enables silicon wafer and SOI manufacturers to drive down 100nm and below device apps.
2003-03-14 KLA-Tencor launches online Taiwan customer support center
KLA-Tencor Corp. has opened its first online support center in Taiwan.
2002-02-12 KLA-Tencor introduces automated wafer backside inspection system
KLA-Tencor Corp. has introduced the industry's first fully-automated wafer backside inspection system that enables non-destructive inspection of the backsides of 300mm wafers.
2008-02-25 KLA-Tencor intends to acquire ICOS Vision Systems
Supplier of inspection and metrology systems KLA-Tencor Corp. has made known its intent to acquire ICOS Vision Systems Corp. NV, vendor of packaging and interconnect inspection solutions for photovoltaic solar technologies and LED lighting products and other semiconductors.
2003-11-28 KLA-Tencor expands reach with Japan center
KLA-Tencor Corp. has opened the industry's first online support center (OSC) in Japan.
2008-05-20 KLA-Tencor expands in Asia with new Singapore facility
KLA-Tencor has opened its new facility in Singapore designed to expand its high-precision manufacturing and well as expand it training, sales and corporate functions.
2002-07-11 KLA-Tencor enhances metrology system
KLA-Tencor Corp. has introduced the Archer Analyzer software for its Archer 10 optical overlay metrology system.
2002-03-19 KLA-Tencor enhances lithography simulation software
The company announced the addition of an etch modeling and analysis module to its PROLITH lithography simulation and modeling software to provide better awareness and control of the impact of lithographic changes on the quality of IC patterns etched into the semiconductor wafer.
2004-04-15 KLA-Tencor creates engineering service team in Singapore
KLA-Tencor has established a team of application and installation engineers in Singapore to improve the efficiency and cost-effectiveness of its engineering services for its growing customer base throughout the Asia-Pacific region.
2006-02-28 KLA-Tencor buys ADE for $488 million
In a move to corner the silicon wafer inspection market, KLA-Tencor Corp. has agreed to acquire ADE Corp. for approximately $488 million in stock.
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