Global Sources
EE Times-Asia
Stay in touch with EE Times Asia
EE Times-Asia > Advanced Search > Litho Yield Sensitivity

Litho Yield Sensitivity Search results

?
?
total search6 articles
2002-09-23 Group to develop low-energy e-beam litho system
Toshiba Corp. and three partners have joined forces to develop a maskless, low-energy electron-beam direct-writing system for SoC devices.
2006-11-28 Clear Shape solution promises fast DFM hotspot detection
Clear Shape Technologies has announced InShape, said to be the first model-based full-chip Design Manufacturability Checker that predicts accurate silicon shapes, providing designers the ability to do fast, accurate DFM hotspot detection of catastrophic failures.
2006-04-20 EDA tool manages process variability early in design stage
Mentor Graphics announced its Calibre LFD (Litho-Friendly Design) product, which is touted to be the first production proven, EDA tool to address the urgent issue of how to manage process variability in the early stages of design creation
2008-03-17 Succeed at 65nm design
A true DFM-aware environment accounts for process variability and lithographic effects in the context of timing, power, noise and yield at every stage of the flow. This begins with the characterization of the cell library, continues through implementation, analysis and optimization, and ends with sign-off verification
2006-11-01 Tool reduces need for immersion at 45nm
Invarium Inc. offers patterning-synthesis software promising, among other things, to limit the number of advanced layers that will require immersion at 45nm. This will allow customers to get more mileage out of existing lithography equipment.
2006-09-20 Tool limits need for immersion lithography at 45nm
Invarium will roll out new patterning-synthesis software this week, promising, among other things, to limit the number of advanced layers that will require immersion at 45nm.
Bloggers Say

Bloggers Say

See what engineers like you are posting on our pages.

?
?
Back to Top