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2015-02-09 SK Hynix, Toshiba join forces for nanoimprint lithography
The companies inked a joint development deal that will allow them to successfully develop NIL by minimising risk and move up commercialisation of this technology.
2008-02-29 Sematech launches nanoimprint litho program
Sematech has started a development program in nanoimprint lithography, a move that's expected to be a major boost in this arena.
2009-01-29 NIL, IMS collaborate on nanoimprint litho
NIL Technology and IMS Chips announced that they have started a collaboration on the fabrication of stamps for nanoimprint lithography by combining their electron beam lithography expertise.
2010-03-03 Nanoimprint still awaits takeoff in HDDs
While nanoimprint has not cracked mainstream production in semiconductor fabs, as some had hoped at one time, the technology has been delayed in perhaps its biggest potential market: HDDs.
2002-12-26 Nanoimprint lithography ready to make its mark
A potentially low-cost form of lithography affectionately known as
2016-04-26 Nanoimprint lithography allows flexible transistor dev't
UW-Madison engineers have pioneered a unique method that could allow makers to easily and cheaply fabricate high-performance transistors on huge rolls of flexible plastic, switching at 110GHz.
2005-04-18 Nanoimprint litho makes its mark at SPIE
While nanoimprint vendors made impressive claims in a recent conference in California, analysts noted that the market is in its infancy.
2007-09-10 Fracture-induced process simplifies nanoimprint litho
Princeton University electrical engineer, Stephen Chou claims to simply nanoimprint lithography by making the circuitry-pattern molds using a new fracture-induced structuring process.
2007-09-13 Firms collaborate on etch process for nanoimprint litho
Nanoimprint lithography stamp provider NIL Technology A/S and Oxford Instruments have partnered to develop etch processes targeted at nanoimprint lithography.
2013-12-05 EVG unveils full-field UV nanoimprint lithography system
Featuring an integrated soft stamp/template fabrication capability, the EVG720 system enables throughputs of more than 60 wafers per hour with the lowest cost of ownership, stated the firm.
2014-12-03 EVG unlocks nanoimprint lithography hub for photonics apps
The Nanoimprint Lithography NILPhotonics Competence Centre aims to help customers assess the technology and equipment for nanoimprint lithography (NIL) in the field of photonics.
2009-07-09 Duo collaborates to push nanoimprint litho
Dai Nippon Printing and Molecular Imprints collaborate to push commercialization of nanoimprint lithography for high-volume semiconductor device manufacturing.
2010-03-16 Canon litho dreams hinge on nanoimprint
An analyst believes that Canon's 'great white hope' in lithography rests with an undisclosed relationship with nanoimprint lithography vendor Molecular Imprints Inc.
2008-05-02 SUSS, Philips cooperate on new imprint litho tech
SUSS MicroTec has entered a license agreement with Philips Research for a new enabling technology called Substrate Conformal Imprint Lithography.
2003-01-13 SUSS device bonders create sub-100nm patterns
SUSS MicroTec has announced that its FC150 and FC250 device bonders are now capable of creating patterns of 100nm and below.
2008-07-16 Litho options falling behind process needs
Who killed high-index lithography, and was politics the cause? These questions remain for chipmakers looking for a route to next-gen manufacturing in a shifting lithography landscape.
2007-05-04 HP licenses nanoscale technology
Hewlett-Packard announced that it is licensing a technology that could enable a more powerful fabrication of semiconductor chips.
2008-05-16 HP details silicon photonics road map
HP has outlined its goal to use silicon photonics to connect blades, boards, chips and eventually cores on the same chip at HP Labs's first annual Photonic Interconnect Forum this week.
2011-10-24 Glass improves lab-on-chip manufacturing
MIT researchers have developed an engraving technique that claims to be more precise than nanoimprint lithography.
2010-09-29 Are Japan litho companies on the way out?
Japanese lithography equipment makers look set to fall further behind market leader ASML Holding NV, according to analysts with investment broker Nomura.
2008-01-08 U.K. researchers prep LEDs for home lighting
University of Glasgow researchers are developing a refinement of LED manufacture based on nanoimprint lithography, which they claim could make way for the solid-state light to replace incandescent light-bulb within three years.
2007-10-26 Toshiba taps optical lithography in fabs
Despite the hype surrounding EUV, nanoimprint and other next-generation technologies, Toshiba is still using optical lithography in its current production fabs.
2010-03-02 SPIE Litho wraps with delays, double-patterning
The themes of this year's SPIE Advanced Lithography event were clear: D and Ddelays and double-patterning. Indeed, EUV is delayed. So is maskless. And nanoimprint is still stuck in R&D.
2013-10-01 A*STAR speeds up commercialisation of nanoimprinting foundry
A*STAR IMRE and its partners launched the Nanoimprint Foundry that will develop, test-bed and prototype specially engineered plastics and surfaces for commercialising the technologies.
2008-02-06 Will EUV litho ever cross over from R&D to production?
The procurement of an R&D EUV lithography tool from Nikon has reportedly been put off by Intel, raising more questions about the viability of EUV for mass chip production.
2010-04-16 When will memristors be ready for prime time?
While memristors represent a potential revolution in electronic-circuit theory akin to the invention of the transistor, it will take a killer application to get it off the ground.
2009-03-03 TSMC details litho roadmap, taps maskless
Taiwan Semiconductor Manufacturing Co. Ltd has detailed it lithography roadmap and said it is still backing maskless technology at the SPIE Advanced Lithography conference.
2007-10-08 Toshiba mulls over 450mm fab, EUV litho
Aiming to maintain its edge in the IC market, Japan's Toshiba Corp. is exploring several new chip-production technologies, including 450-mm fabs and EUV lithography.
2007-10-19 Toshiba 'validates' imprint litho for 22nm CMOS
Toshiba Semiconductor has reportedly validated the use of imprint lithography technology in developing 22nm node CMOS devices.
2008-06-23 Toppan, IBM extend photomask partnership to 22nm
Toppan Printing Co. Ltd and IBM Corp. have entered a new development agreement on the last phase of 32nm and all phases of 22nm photomask process development.
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