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2009-12-15 Nikon eyes litho rebound with double-patterning
Nikon Corp. is looking to regain share, especially in the upcoming double-patterning era, according to an analyst.
2010-03-02 SPIE Litho wraps with delays, double-patterning
The themes of this year's SPIE Advanced Lithography event were clear: D and D!delays and double-patterning. Indeed, EUV is delayed. So is maskless. And nanoimprint is still stuck in R&D
2010-06-25 Nikon stays optimistic amid losses
Nikon formulated a three-year medium term management plan that will run from fiscal 2011 to 2013. One of the goals is to bring the fab tool business back in the black
2008-07-22 EUV delays drive shift to double-patterning
With the probable delays for EUV lithography, ASML, Canon and Nikon are racing each other to capitalize on the shift towards double-patterning technology at the 32nm node and beyond.
2010-01-08 Buzz: TSMC buys Nikon 193nm litho scanner
In a surprise move, TSMC has procured a new 193nm immersion lithography scanner from rival Nikon Corp., according to sources
2009-05-19 ASML to benefit from Nikon EUV litho delay
Nikon is said to have put on hold development of some of its extreme ultraviolet (EUV) tools, which could give ASML a huge early advantage in commercial deployments of the emerging chip making technology
2009-02-25 Intel: EUV litho roadblocks ahead
A top technologist at Intel Corp. warned that a lack of mask inspection gear for extreme ultraviolet (EUV) lithography is threatening the process' future viability in the market.
2009-06-23 Intel scales down 193nm litho to 15nm
Intel claims that it has pushed 193nm immersion lithography down to 15nm!at least in the lab.
2010-02-26 EUV delay forces tool makers to check other options
EUV lithography is delayed again and is now targeted for chip production at the 16nm half-pitch node, leaving the industry to face the dreaded double-patterning or some variation of the technology
2008-02-06 Will EUV litho ever cross over from R&D to production?
The procurement of an R&D EUV lithography tool from Nikon has reportedly been put off by Intel, raising more questions about the viability of EUV for mass chip production
2007-10-08 Toshiba mulls over 450mm fab, EUV litho
Aiming to maintain its edge in the IC market, Japan's Toshiba Corp. is exploring several new chip-production technologies, including 450-mm fabs and EUV lithography.
2009-07-09 Top 10 industry issues
Here are the top 10 looming issues that the semiconductor capital equipment industry is facing.
2010-02-23 Samsung to push EUV litho by 2012
Samsung Electronics Co. Ltd announced its plans to push wants extreme ultraviolet (EUV) lithography by 2012 despite signs that the technology will not be ready by that time at the LithoVision 2010.
2010-04-07 Quest for the right road to lithography
The industry has long known that without a viable NGL solution!which most assumed would be EUV!Moore's Law scaling would slow and the secular growth rate of the IC industry would decline.
2007-02-01 Logic chipmakers seek 32nm breakthroughs
Even as they put the finishing touches on their 45nm process technologies and tweak them for low power, leading-edge logic chipmakers are scrambling to find manufacturing breakthroughs for the 32nm node and beyond.
2006-08-01 Lithography efforts trailing 32nm target
The chip industry is enjoying a short reprieve as immersion lithography continues Moore's Law of scaling for the next few years. But for chips with a 32nm half-pitch, lithographers are counting on either extreme ultraviolet or immersion 193nm scanners enhanced with high-index fluids.
2009-03-06 Litho woes: R&D gap, downturn
It was a triple-whammy for lithographers at the SPIE Advanced Lithography conference as the industry continues to be plagued by an R&D gap, technology delays, and, of course, the lousy economy.
2008-07-16 Litho options falling behind process needs
Who killed high-index lithography, and was politics the cause? These questions remain for chipmakers looking for a route to next-gen manufacturing in a shifting lithography landscape.
2008-12-12 Intel widens lead in high-k/metal gate race
Intel is expected to extend it s its lead over Advanced Micro Devices, IBM and other microprocessor vendors in the high-k/metal-gate race at next week's International Electron Devices Meeting.
2007-06-25 Intel drafts inverse litho to cover EUV delay
With the possible delay of its EUV lithography, Intel disclosed it is developing a DFM technology that could extend optical scanners to the 22nm node.
2010-03-22 IC forecasts: What keeps analysts bullish, worried
Although the signs are positive in the chip sector this year, there are still some concerns. Here are 10 reasons to remain bullish!and worried!about 2010.
2007-02-27 IBM pushes for immersion at 22nm
IBM outlined last week its lithography roadmap, saying that it would extend 193nm immersion lithography down to the 22nm node for logic production.
2011-02-07 First EUV tool ships amid power, tech concerns
ASML may have shipped the world's first EUV lithography tool, but experts insist EUV is not yet ready.
2009-02-26 Firms gear for EUV litho despite tool delay
ASML Holding NV has slightly delayed the delivery schedule for its "pre-production" extreme ultraviolet (EUV) lithography tool by a quarter or so.
2008-01-08 Fearless IC forecasts for 2008
To help sort chip market confusion, EE Times' Mark LaPedus released his own chip forecasts!and other predictions!for 2008.
2010-03-24 Execs weigh in on right path for litho
Was EUV the wrong bet for the industry? If so, what should it be working on instead? And who will benefit in the long run? Litho experts and executives give their opinions on these hot questions.
2011-03-03 EUV late for 10nm party, says Intel
Although it is late for the 10nm design rule definition stage at Intel,
2009-09-23 Canon litho dreams hit price roadblock
The end could be near for Canon Inc.'s lithography efforts, as the company is reportedly mulling plans to cease future, high-end scanner development, according to sources.
2010-09-29 Are Japan litho companies on the way out?
Japanese lithography equipment makers look set to fall further behind market leader ASML Holding NV, according to analysts with investment broker Nomura.
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