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2011-03-16 Japan quake raises concerns over electronics supply chain
According to analysts, the devastating earthquake that hit Japan, a key source of chips supporting CE devices, could lead to production decrease, phenomenal price swings and large near-term shortages.
2003-09-04 Japan plays catch-up on EUV lithography
A consortium of nine Japanese companies working on extreme-ultraviolet lithography says it is making steady progress toward a spring 2006 target for fielding an alpha tool that would provide 10W of EUV output power.
2009-06-25 Intel: Fab tool market savior?
Intel Corp. continues to fund technologies and procure fab-equipment, but behind the scenes, the company is investing in some companies and brokering deals for others, reportedly including ASM International NV and NuFlare Technology Inc., sources said.
2009-02-25 Intel: EUV litho roadblocks ahead
A top technologist at Intel Corp. warned that a lack of mask inspection gear for extreme ultraviolet (EUV) lithography is threatening the process' future viability in the market.
2009-06-16 Intel, TSMC to tap ASML's EUV litho tool
Hynix Semiconductor, IMEC, Intel, Samsung, Toshiba and possibly Taiwan Semiconductor Manufaturing Co. are the initial customers for ASML Holding NV's "pre-production" extreme ultraviolet (EUV) lithography tool.
2008-12-12 Intel widens lead in high-k/metal gate race
Intel is expected to extend it s its lead over Advanced Micro Devices, IBM and other microprocessor vendors in the high-k/metal-gate race at next week's International Electron Devices Meeting.
2008-10-31 Intel to showcase 32nm technology at confab
In the upcoming 2008 IEEE International Electron Devices Meeting, Intel is expected to release its new 32nm process technology for high-capacity microprocessors.
2009-06-23 Intel scales down 193nm litho to 15nm
Intel claims that it has pushed 193nm immersion lithography down to 15nmat least in the lab.
2006-11-10 Intel recruits Japanese equipment companies for Fab 28
Several Japanese semiconductor manufacturing equipment companies are already supplying services for Intel's 300mm Fab 28 wafer fab in Kiryat Gat, Israel.
2015-03-06 Intel recommends 2.5D, 3D integration for next-gen chips
Intel emphasised that heterogeneous integration enabled by 3D IC is essential to the development of future SoCs, especially in terms of scaling lithography processes.
2007-08-16 Intel pulls ahead in processor capex race
Advanced Micro Devices Inc. and Intel Corp. are taking different paths in IC manufacturing, but the traditional capital-spending race appears to be over in the x86-based processor arena.
2004-07-19 Intel moves up debut of billion-transistor chip
Not only does Intel Corp., the world's largest chipmaker, believe Moore's Law is alive and well, it is aiming to deliver a billion-transistor chip in 2005, rather than the original target date of 2007.
2005-03-28 Intel invests in electronic paper display startup
E Ink Corp., a developer of electronic paper display technology, announced that Intel Capital has invested an undisclosed amount in the company.
2010-02-24 Intel extends immersion litho to 11nm, delays EUV
Intel Corp.'s lithography roadmap plans to extend its 193nm immersion to the 11nm logic node and delay extreme ultraviolet (EUV)again.
2003-05-28 Intel drops 157 litho from roadmap
Intel dropped a bomb on the lithography industry when it said it has removed the 157nm lithography generation from its tech roadmap.
2007-06-25 Intel drafts inverse litho to cover EUV delay
With the possible delay of its EUV lithography, Intel disclosed it is developing a DFM technology that could extend optical scanners to the 22nm node.
2007-11-21 Intel CEO to tool makers: 'Let's cooperate on 450mm'
Despite some resistance for 450mm fabs in the market, Intel is moving ahead with 450mm technology and would like to cooperate with the IC-equipment industry in the arena, according to Paul Otellini, president and CEO of the chip giant.
2002-07-25 Industry said to face steep lithography challenges
Many in the semiconductor industry underestimate the technical and economic challenges posed by new forms of lithography, said Phil Ware, senior fellow at Canon Inc.
2011-11-08 IHS: Thai floods drown electronics sector
The Thailand flooding represents the second major natural disaster to affect the industry this year after the March 2011 Japan earthquake.
2010-03-22 IC forecasts: What keeps analysts bullish, worried
Although the signs are positive in the chip sector this year, there are still some concerns. Here are 10 reasons to remain bullishand worriedabout 2010.
2003-07-15 IBM study finds no ill effects on lithography
Researchers confirmed that early pattern imaging at IBM Corp.'s Almaden Research Center on wafers immersed in water has performed much better than expected.
2007-02-27 IBM pushes for immersion at 22nm
IBM outlined last week its lithography roadmap, saying that it would extend 193nm immersion lithography down to the 22nm node for logic production.
2006-02-22 IBM claims 193nm litho record
At the SPIE Microlithography Conference, IBM said that it has created the world's smallest line patterns using 193nm optical lithography.
2009-04-20 IBM 'fab club' tips 28nm high-k process
Despite the downturn, the silicon foundry business is heating up as IBM Corp.'s "fab club" has officially rolled out its 28nm process based on high-k dielectrics and metal gates.
2005-06-29 Hitachi, Tegal win fab-tool satisfaction rankings
Hitachi High-Technologies Corp. and Tegal Corp. separately received the highest ratings in their respective categories for customer satisfaction in the chip-equipment industry for 2005, according to an annual survey conducted by VLSI Research Inc.
2007-05-08 Handset maker licenses Moore Microprocessor patents
Nokia has licensed the Moore Microprocessor Patent (MMP) portfolio from The TPL Group, making it the first mobile phone maker to enter into such an agreement.
2009-07-20 Globalfoundries details process roadmap
Taking on foundry giants, startup Globalfoundries Inc. has outlined its process roadmap and disclosed plans to break ground on its new U.S. fab.
2008-06-03 Gartner ups 2008 IC forecast to $287B
Gartner Inc. has raised its worldwide IC forecast from 3.4 percent to 4.6 percent for 2008, to reach $287 billion, up from $274 billion in 2007.
2011-02-07 First EUV tool ships amid power, tech concerns
ASML may have shipped the world's first EUV lithography tool, but experts insist EUV is not yet ready.
2009-02-26 Firms gear for EUV litho despite tool delay
ASML Holding NV has slightly delayed the delivery schedule for its "pre-production" extreme ultraviolet (EUV) lithography tool by a quarter or so.
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