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2006-01-31 Tool claims dramatic reduction in OPC closure time
Aprio introduced the Halo-Fix tool that makes available the LRC repair technology used by the company's Halo-OPC product to manufacturers using third-party LRC and OPC tool sets.
2007-04-19 Synopsys, NGR team on faster OPC model at 45nm
Synopsys and NanoGeometry Research announced they have partnered to enable faster, more accurate, more predictive optical proximity correction (OPC) model-building at 45nm and beyond.
2004-10-22 Synopsys OPC software increases HHNEC wafer yields
Synopsys Inc. revealed that Shanghai Hua Hong NEC Electronics Ltd (HHNEC) has adopted its Proteus optical proximity correction (OPC) software.
2002-10-16 Scalable DP, OPC bridge subwavelength distortions
This article introduces OPC techniques and their correlation to data volumes and then examines the pros and cons of the available solutions used to tackle volumes.
2011-08-25 OPC-HAD support in data acquisition platform
MathWorks has updated its OPT Toolbox that can now deliver historical process data from an OPC HAD server.
2006-09-18 OPC tool has mask 3-D imaging effects
Brion Technologies introduced Tachyon M3D that promises more accurate OPC implementation and verification by incorporating mask three-dimensional imaging effects.
2005-01-14 OPC tool aims to cut IC manufacturing time
Aprio Technologies will introduce its first product this weeka "reconfigurable" OPC tool suite aimed at manufacturing groups.
2004-09-20 NEC employs Synopsys OPC software for 90nm production
NEC Electronics Corp. has adopted Synopsys Inc.'s Proteus optical proximity correction (OPC) software for 90nm production.
2006-04-03 Easier OPC is tools' promise
Aprio Technologies and Brion Technologies recently launched optical proximity correction tools that promise greater accuracy and flexible user controllability.
2007-01-16 Cell processors rev OPC in nm designs
Nanometer chip design is becoming so compute-intensive that it needs supercomputer-like capability, according to Mentor Graphics Corp. and Mercury Computer Systems Inc.
2006-10-04 Yogitech unveils 'first' Open Core Protocol UVC
Yogitech, a provider of design and verification technology, announced what it touts as the industry's first mixed-language Open Core Protocol universal verification component.
2005-02-04 UMC adopts Magma extractor tool on 0.13?m process
United Microelectronics Corp. (UMC) has validated Magma Design Automation Inc.'s QuickCap NX extractor tool on its 0.13?m process.
2004-02-02 Toolset eyes process test-chip design
Silicon Canvas released a platform for process test-chip development that is designed to help foundries create test chips to verify, optimize and calibrate silicon processes.
2005-06-09 TI sticks with Synopsys for 65nm, 45nm nodes
Texas Instruments Inc. has decided to extend its use of design-for-manufacturing EDA tools from Synopsys Inc. to the 65nm manufacturing process node and has selected two Synopsys technology CAD tools for use at the 45nm node, Synopsys said
2005-07-01 The need to design for uncertainty
If there was a message for chip designers from two recent industry conferences, the ISPD and the EDP, it was this: Get used to uncertainty. The era of 'design for variability' is here.
2006-09-22 Synopsys, Nikon co-develop 45nm solutions
Synopsys and Nikon have tied up to develop and deliver advanced lithography software models and DFM-enabled lithography manufacturing solutions for 45nm and below.
2004-06-01 Startup takes a novel design-for-yield approach
Anchor Semiconductor says it offers the market's first silicon design-rule-checking tool.
2003-09-16 Redefining design for yield, manufacturability
By adopting a more design-driven approach to production, many of the yield and manufacturing issues daunting the semiconductor industry can be addressed before they even occur.
2001-05-16 Practical IC design in the sub-wavelength regime
Demonstrated success of sub-wavelength lithographic processes has created the demand for a more robust, comprehensive design flow.
2005-12-01 Manufacturing moves into design flow
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2007-03-14 Litho optimization solution suits 32nm designs
KLA-Tencor has introduced the latest version of its PROLITH lithography optimization productthe PROLITH 10which enables users to accurately predict lithography process windows for IC designs down to 32nm.
2001-03-01 Library generators employ optical correction at cell level
This technology article discusses the enhancement of cell-based designs with the evolution of EDA.
2006-09-01 EDA app shows variants of IC design
DFM tool provider Aprio Technologies Inc. has developed an application extension, Halo-Quest, designed to fit on top of EDA design and analysis tools, and to generate accurate silicon image representation of IC designs for use within design flows.
2006-12-05 Cell BE platform accelerates optical proximity correction
Mentor Graphics and Mercury Computer Systems are bringing out what they say is the first Cell BE-based acceleration platform for the EDA market.
2005-05-16 Across the flow: DFM's many faces
EDA toolmakers, designers forge partnership to develop new DFM process flow
2005-03-04 Synopsys software tool allows Grace to produce high-yielding chips
Synopsys Inc. announced that China-based Grace Semiconductor Mfg Corp. has adopted the Proteus optical proximity correction (OPC) software and SiVL lithography verification tool.
1999-12-09 Industrial Automation Interfaces for NI-DAQ
Using either OPC or native BridgeVIEW and Lookout device servers for NI-DAQ, you can quickly and easily integrate DAQ and SCXI hardware with HMI/SCADA and other industrial software packages that implement OPC client interfaces.
2005-06-20 Grace adopts Synopsys tool suite for chip production
Mainland China-based pure IC foundry Grace Semiconductor Mfg Corp. has adopted U.S.-based Synopsys Inc.' design for manufacturing (DFM) tool suite, particularly using the Proteus optical proximity correction (OPC) software and SiVL lithography verification tool to lower mask turnaround time and to enhance its ability to produce high-yielding chips.
2009-10-21 GlobalFoundries taps Mentor EDA tools
GlobalFoundries chose Mentor Graphics for its physical verification, RET, OPC and mask data preparation solutions.
2006-12-04 Clear Shape offers electrical DFM analysis solution
Clear Shape Technologies has announced OutPerform, said to be the first complete and silicon-correlated electrical DFM analysis and optimization product to enable designers using sub-90nm processes to control the impact of lithography, mask, etch, RET, OPC and CMP effects on their chip parameters.
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