Global Sources
EE Times-Asia
Stay in touch with EE Times Asia
EE Times-Asia > Advanced Search > TCAD

TCAD What is CAD (Computer-Aided Design)? Search results

What is CAD (Computer-Aided Design)?
CAD electronic design automation (EDA) of projects that were previously under manual methods considered to be drafting functions. It typically refers to PCB layout, wire harness design or mechanical design.
total search32 articles
2005-10-19 Tool suite 'lays foundation' for extending TCAD to DFM
Synopsys introduced early this week a new TCAD tool suite that integrates features of former TMA and ISE products as well as adding new capabilities that enable TCAD to be used in the manufacturing space.
2012-10-23 TCAD eases FinFET design and variability analysis
FinFET is the first fundamental change in transistor architecture since the time MOSFET replaced bipolar transistor as the transistor of choice for logic applications.
2011-02-15 Synopsys, Varian team on TCAD model development
Enabling cryogenic ion implantation, the TCAD Sentaurus models will speed up process development of leading-edge CMOS and memory devices, and cut process development cost and time-to-market.
2009-10-14 NREL adopts Synopsys TCAD for solar cells
The U.S. National Renewable Energy Laboratory has selected Synopsys' Sentaurus TCAD to create solar cell models.
2005-06-09 TI sticks with Synopsys for 65nm, 45nm nodes
Texas Instruments Inc. has decided to extend its use of design-for-manufacturing EDA tools from Synopsys Inc. to the 65nm manufacturing process node and has selected two Synopsys technology CAD tools for use at the 45nm node, Synopsys said
2013-01-25 Synopsys boosts uptake of FinFETs
The solution for FinFET-based designs includes various DesignWare Embedded Memory and Logic Library IP, silicon-proven design tools and foundry-endorsed extraction, simulation and modelling tools.
2003-07-16 Substrate noise can tax tools, methodologies
Raminderpal Singh, manager of Process Design Kit Development at IBM, says complex substrate-modeling, prediction methodologies and tools can all prove futile in IC design without understanding the "bigger" parasitic future.
2009-04-07 Singapore R&D institute adopts Synopsys tools
Solar Energy Research Institute of Singapore (SERIS) has adopted Synopsys Inc.'s Sentaurus TCAD to support its solar cell R&D programs. The Sentaurus TCAD tools will initially be used to support SERIS' silicon-based solar cell research.
2013-08-07 Sematech, Silvaco to co-develop advanced modelling tools
The collaboration between Sematech and Silvaco will forward the development of advanced modelling tools for the next generation of semiconductors.
2012-12-14 Imec advances UHF Schottky diode, 10nm FinFETs
Imec presented a ultra-high frequency Schottky diode based on amorphous IGZO as semiconductor and announced its collaboration with Synopsys for 10nm FinFETs.
2012-07-31 Simulation reveals double battery life thru FinFETs-on-SOI
Gold Standard Simulations performed TCAD simulations where fully depleted FinFET style transistors made on SOI wafers allowed between half and one-third the leakage current of FinFETs made on bulk silicon.
2013-07-22 Virtual design, verification for e-Mobility
Learn how to address many of the emerging engineering challenges that carmakers now face.
2004-03-19 Varian, ISE to codevelop doping, diffusion models
Varian Semiconductor Equipment Associates Inc. has entered into a joint development agreement with ISE Integrated System Engineering AG to develop advanced doping and diffusion models for the continued scaling of semiconductor devices beyond the 90nm node.
2008-01-24 Tool speeds up design of optoelectronic devices
Acceleware and Synopsys have developed a hardware solution that enables up to 20x faster electromagnetic simulation of optoelectronic devices such as CMOS image sensors.
2008-09-12 Synopsys, Ovonyx develop simulation model for PCM
Synopsys Inc. and Ovonyx Inc. have teamed up to develop of device simulation models for phase change memory (PCM) based on Ovonyx's PCM technology.
2006-10-31 Synopsys unveils DFM tools for 45nm, beyond
Synopsys has unveiled a new family of process-aware DFM products that analyze variability effects at the custom/analog design stage for 45nm and smaller designs.
2004-10-22 Synopsys OPC software increases HHNEC wafer yields
Synopsys Inc. revealed that Shanghai Hua Hong NEC Electronics Ltd (HHNEC) has adopted its Proteus optical proximity correction (OPC) software.
2004-10-21 Synopsys buys PCI Express IP vendor Cascade Semi
Synopsys Inc. is continuing its shopping spree, announcing Oct. 18 that it has acquired PCI core vendor Cascade Semiconductor Solutions Inc. for an undisclosed amount.
2004-11-05 Synopsys buys assets of mixed signal IP vendor
Continuing its acquisition streak Synopsys Inc. announced Tuesday (Nov.2) that it has acquired certain assets of mixed-signal intellectual property company LEDA Design for an undisclosed amount.
2006-08-21 Synopsys broadens DFM portfolio with SIGMA-C acquisition
Synopsys Inc. announced that it has completed the acquisition of SIGMA-C Software AG in an all-cash transaction of $20.5 million.
2006-05-01 Synopsys adding to its DFM lineup
Included in Synopsys' yearend agenda is the addition of a dual-domain simulation product and a next-generation yield analysis tool to its DFM product family.
2012-05-10 Synopsys acquires photonics design tool company
A Synopsys executive said the addition of RSoft's products would expand Synopsys' product line in both the optical and adjacent photonic markets.
2008-07-30 National hails Synopsys as its key EDA partner
Synopsys has announced that the company was chosen by National as its key EDA partner in product development.
2012-06-08 Intel finFETs show variability, need SOI for scaling
GSS has concluded that Intel may need to turn to SOI wafers to scale its FinFETs below 22nm, which may have implications for foundries that are yet to introduce FinFET technology into their chip manufacturing processes.
2010-03-11 IMEC, Synopsys join hands on 3D stacked ICs
Synopsys Inc. and IMEC have partnered to accelerate the development of 3D stacked IC technologies.
2012-06-04 Imec tackles variability issues beyond the 10nm node
Tomorrow's smart systems will require more computing power and storage capacity, exceeding what today's processors and memories can deliver. This drives the need for technology scaling.
2006-10-18 IC design tool touts process-aware DFM
Synopsys two "process-aware" tools that help custom- and analog-IC designers analyze the impact of transistor variability on circuit layouts.
2008-09-19 IBM pushes 'computational scaling' for 22nm
Amid probable delays with extreme ultraviolet (EUV) lithography, IBM Corp. plans to extend 193nm immersion and move towards what the company calls "computational scaling" technology for the 22nm node and perhaps beyond.
2008-09-25 IBM opens gates of 300mm fab
Up until recently, IBM Corp. and its secretive chip unit refused to reveal any information about its semiconductor operations.
2004-04-16 EDAC expands tracking of IP industry revenues
The EDA Consortium's Market Statistics Survey group, which tracks and reports quarterly EDA industry revenues, is expanding its tracking of silicon intellectual property (SIP), adding 40 new IP categories.
Bloggers Say

Bloggers Say

See what engineers like you are posting on our pages.

Back to Top