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2008-03-17 Succeed at 65nm design
A true DFM-aware environment accounts for process variability and lithographic effects in the context of timing, power, noise and yield at every stage of the flow. This begins with the characterization of the cell library, continues through implementation, analysis and optimization, and ends with sign-off verification.
2004-10-07 Renesas standardizes on Cadence MaskCompose
Renesas Technology Corp. has standardized Cadence Design Systems Inc.'s MaskCompose for automated reticle design synthesis in its 90nm design flow.
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