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2005-09-23 Platform partners integrate design-for-manufacturing
IBM, Chartered Semiconductor Mfg and Samsung Electronics Co. Ltd have entered into an initial set of solutions for their cross-fab, common design-for-manufacturability (DFM) initiative. The multi-faceted effort, which includes participation by electronic design automation (EDA) and DFM tool suppliers, is expected to offer a series of rules, models and utility kits that provide new levels of predictability and control to achieve working silicon faster and yield ramp more efficiently.
2004-11-01 Wanted: New class of engineering generalists for DFM
Symposium sees need for 'tall and fat' engineers to help 'reintegrate' IC production.
2006-06-27 UMC is getting 65nm interest
According to major silicon foundry United Microelectronics Corp., it has been getting a lot of interest in 65nm designs.
2005-05-11 TSMC expands DFM recommendations at 90nm
Taiwan Semiconductor Mfg Co. Ltd is expanding its design-for-manufacturing recommendations for engineers working with 90nm design rules, company managers told the TSMC 2005 Technology Symposium here last week.
2004-09-17 Synopsys, Photronics form DFM collaboration
EDA software vendor Synopsys Inc. and Photronics, a photomask company, have formed a collaborative program intended to improve the manufacturability and quality of advanced photomasks and reduce design-to-photomask cycle times, Synopsys said.
2006-10-31 Synopsys unveils DFM tools for 45nm, beyond
Synopsys has unveiled a new family of process-aware DFM products that analyze variability effects at the custom/analog design stage for 45nm and smaller designs.
2005-07-15 Synopsys announces support for Oasis file transfer format
Synopsys Inc. said that its Galaxy design platform and design-for-manufacturing (DFM) tool suite support the entire Open Artwork System Interchange Standard (Oasis) file transfer format with all current production releases.
2006-06-01 Startup enables IC variability characterization
In a bid to enable silicon fabs to provide statistical parametric characterization, Stratosphere Solutions Inc. recently introduced intellectual property that inserts test structures in silicon wafers.
2010-12-06 SMIC chooses Cadence for 65-nm reference flow
Cadence Design Systems, Inc., has just announced that SMIC has adopted Cadence Silicon Realization products for the DFM and low-power technology at the center of SMIC's 65-nanometer Reference Flow 4.1.
2006-07-04 Semicon forecast: second half will be rough
2006 has seen it alla stock option scandal, different chip predictions, materials shortages and it's not even over yet. Here's our take on where things stand and where we see the industry heading.
2009-03-24 Process variability gets a second chance
Mentor Graphics Corp. has a new message: process variability is not all bad. In fact, it could be considered a competitive advantage if properly dealt with, according to executives at the firm.
2003-12-01 Process tool promises yield optimization
PDF Solutions is expanding into EDA with a tool that claims to improve designs for optimum yield during the physical-synthesis step in the digital IC design process.
2005-10-07 New DFM reference design flow for austriamicro's CMOS process
austriamicrosystems' business unit Full Service Foundry recently announced the availability of its DFM reference design flow for its 0.35?m high-voltage CMOS process.
2006-09-18 New DFM methods enable early yield prediction
New DFM methodologies such as RRA and CAA, combined with traditional DRC and accurate fab yield impact data, enable designers to determine whether design modifications actually result in higher-yielding silicon.
2005-05-11 NEC to work with Aprio on design-for-manufacture
Aprio Technologies Inc., a startup company developing design-for-manufacturing (DFM) software, said its products would be used by Japan's NEC Electronics.
2005-12-22 NEC adopts Synopsys' PSM tech
Synopsys announced that NEC Electronics has adopted Synopsys' phase-shift mask technology for production of its high-performance 65nm processor and logic chips.
2006-10-02 Migration to 90nm faster than expected
Despite the challenges, the transition to 90nm designs is proceeding more smoothly than the earlier move to 130nm design rules.
2004-12-15 Mentor adds more functions to Calibre platform
Mentor announced additional functionality for its Calibre design-to-silicon platform in the form of Calibre Transition, Measure and Analyze.
2007-03-05 Integrated DFM solutions still lacking
According to a Charted Semi exec, EDA has done a great job of raising awareness of DFM issues, but integrated DFM solutions remain scarce.
2005-06-29 Innovation, cooperation key to overcoming DFM issues, says Synopsys exec
Speaking to an audience of mostly photomask manufacturing executives at the Advanced Reticle Symposium Tuesday (June 28), Synopsys Inc.'s Michel Cote praised the way the EDA industry has responded to design-for-manufacturing (DFM) challenges with innovation and said continued industry cooperation is the key to overcoming them.
2005-06-20 Grace adopts Synopsys tool suite for chip production
Mainland China-based pure IC foundry Grace Semiconductor Mfg Corp. has adopted U.S.-based Synopsys Inc.' design for manufacturing (DFM) tool suite, particularly using the Proteus optical proximity correction (OPC) software and SiVL lithography verification tool to lower mask turnaround time and to enhance its ability to produce high-yielding chips.
2007-05-25 Fujitsu taps Mentor to improve DFM capabilities
Mentor Graphics announced that Fujitsu will use Mentor's Calibre LFD to enhance their DFM capabilities for internal product development and for external fabless customers.
2007-09-21 Firms join forces to advance DFM
The Silicon Integration Initiative (Si2) announced that top chip makers and EDA tool vendors have established a design-for-manufacturing (DFM) coalition intended to build on previous DFM efforts.
2006-03-16 ESL design tools come up short
ESL and DFM tools need to pack far more capabilities than they do today if they are to represent the EDA industry's best opportunities for growth.
2006-04-20 EDA tool manages process variability early in design stage
Mentor Graphics announced its Calibre LFD (Litho-Friendly Design) product, which is touted to be the first production proven, EDA tool to address the urgent issue of how to manage process variability in the early stages of design creation.
2007-02-28 EDA CEOs see strong 2007
2007 should be another strong year for the EDA industry, according to CEOs who spoke at the EDA Consortium's annual forecast panel last week.
2006-09-01 EDA app shows variants of IC design
DFM tool provider Aprio Technologies Inc. has developed an application extension, Halo-Quest, designed to fit on top of EDA design and analysis tools, and to generate accurate silicon image representation of IC designs for use within design flows.
2006-01-12 DFM tool helps prevent mask failure at 65nm and below
SIGMA-C Software's microlithography simulation/image verification tool enables the transfer of electronic designs unto printed wafers to help prevent mask failure at 65nm and below.
2005-07-01 DFM litho tool aims for two worlds
Sigma-C's Solid+ acts as a virtual exposure tool to simulate microlithography and identify problem areas in the design process.
2009-07-31 DAC panel revisits DFM debate
Panelist revived the debate on design for manufacturing, with one executing calling it a 'band-aid with diminishing returns.'
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