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2004-09-17 Synopsys, Photronics form DFM collaboration
EDA software vendor Synopsys Inc. and Photronics, a photomask company, have formed a collaborative program intended to improve the manufacturability and quality of advanced photomasks and reduce design-to-photomask cycle times, Synopsys said
2004-06-16 Mentor CEO confirms DFM as best bet for EDA boost
Finding sustainable growth in the EDA industry is not an easy thing, according to Wally Rhines, Mentor Graphics CEO and chairman of the EDA Consortium.
2005-06-13 Intel, KLA-Tencor back DFM startup
The world's largest semiconductor manufacturer and one of the largest semiconductor equipment manufacturers have taken interest-and financial positions-in Clear Shape Technologies Inc., a design-for-manufacture (DFM) software startup.
2005-03-23 DFM startup appoints EDA experts to advisory board
Aprio Technologies Inc., a startup company developing design-for-manufacturing (DFM) software, has appointed four luminaries of the EDA and semiconductor industries to its technical advisory board.
2004-11-01 Wanted: New class of engineering generalists for DFM
Symposium sees need for 'tall and fat' engineers to help 'reintegrate' IC production.
2006-07-26 TSMC adds support for Blaze DFM optimization software
Taiwan Semiconductor Manufacturing Co. Ltd is adding support for Blaze MO optimization software from Blaze DFM Inc. with both companies supplying evaluation kits.
2004-10-22 Synopsys OPC software increases HHNEC wafer yields
Synopsys Inc. revealed that Shanghai Hua Hong NEC Electronics Ltd (HHNEC) has adopted its Proteus optical proximity correction (OPC) software
2004-09-01 Synopsys CEO calls for DFM cooperation
Synopsys CEO called on the design and fab communities to develop
2006-08-21 Synopsys broadens DFM portfolio with SIGMA-C acquisition
Synopsys Inc. announced that it has completed the acquisition of SIGMA-C Software AG in an all-cash transaction of $20.5 million
2004-10-12 PDF Solutions, Virage to add DFM to cell libraries
PDF Solutions Inc., a vendor of yield optimization software, is partnering with Virage Logic Corp. to create process-aware extensions to Virage's standard cell IP libraries, PDF said Wednesday (Oct. 6
2004-09-20 NEC employs Synopsys OPC software for 90nm production
NEC Electronics Corp. has adopted Synopsys Inc.'s Proteus optical proximity correction (OPC) software for 90nm production
2004-11-19 Micron adopts Synopsys SiVL DFM for 90nm production
Micron Technology Inc. has chosen Synopsys Inc.'s SiVL silicon-versus-layout software to help implement its advanced DRAMs, flash memories, CMOS image sensors, and other semiconductor components
2007-09-24 Magma, UMC deliver verification, DFM tools for 65nm
Magma Design Automation Inc. has partnered with UMC to deliver a broad physical verification and design for manufacturability solution for 65nm designs.
2005-03-09 Indian EDA firm to launch software modules for DFM products
SoftJin said it would provide customized software development and building blocks to address the needs of suppliers in the DFM, DFY and programmable platforms products areas.
2004-06-22 Grid software firm seeks role in global design
Electronic design activities are moving to places like mainland China and India after bursting of bubble.
2005-06-14 Emerging DFM, verification technologies most exciting, CTOs say
Emerging technologies for design for manufacturing (DFM) and verification are the most exciting developments in the design realm, concluded a panel of chief technology officers convened here Monday (June 13) at the Design Automation Conference (DAC
2006-01-24 EDA partnership yields DFM sign-off tool
Nannor Technologies Inc. and Predictions Software announced the integration of the Acuma chip level layout optimization tool and the EYES yield analysis software
2006-09-21 DFM tool implements yield improvement at design stage
Nannor said its upgraded Acuma tool reduces semiconductor design iterations and manufacturing costs by revealing yield-sensitive areas of the design and implementing yield improvement at the design stage.
2006-01-12 DFM tool helps prevent mask failure at 65nm and below
SIGMA-C Software's microlithography simulation/image verification tool enables the transfer of electronic designs unto printed wafers to help prevent mask failure at 65nm and below
2005-07-01 DFM litho tool aims for two worlds
Sigma-C's Solid+ acts as a virtual exposure tool to simulate microlithography and identify problem areas in the design process.
2007-03-16 DFM demands holistic approach
The infrastructure required to make trade-offs among the different techniques and determine the optimal approach should be one where the actual software takes into account the implications of other DFM issues. The idea is to create a holistic approach to DFM for the design and analysis flow.
2003-05-09 Cadence buys mask prep company in DFM push
Cadence Design Systems Inc. is jumping firmly into the emerging design for manufacturing market following an announcement that it has acquired K2 Technologies Inc.
2006-11-16 DFM too complex,' experts say
Speakers told the Bacus Photomask Technology Symposium that DFM technology is too complex and suggested the use of standardized layout elements, library cells or an "integrated" DFM methodology
2004-06-11 Cadence adds DFM tools to Encounter
Cadence Design Systems Inc. said it has signed a multi-year business agreement with ASML MaskTools to co-develop design-for-manufacturing tools.
2004-09-29 Synopsys looking to acquire PDF Solutions, says analyst
EDA giant Synopsys Inc. is reportedly looking to acquire design-for-manufacturing (DFM) software specialist PDF Solutions Inc., an analyst from American Technology Research Inc. said Friday (Sept. 24).
2003-12-01 Process tool promises yield optimization
PDF Solutions is expanding into EDA with a tool that claims to improve designs for optimum yield during the physical-synthesis step in the digital IC design process.
2005-05-11 NEC to work with Aprio on design-for-manufacture
Aprio Technologies Inc., a startup company developing design-for-manufacturing (DFM) software, said its products would be used by Japan's NEC Electronics.
2006-12-12 UMC, Integrand expand collaboration to 90nm, 0.13?m RFCMOS
Integrand Software and UMC announced that their ongoing collaboration has resulted in enhanced capabilities for RF/mixed mode IC designers designing into 90nm and 0.13?m nodes
2005-05-26 UMC adopts Synopsys i-Virtual stepper system for photomask
United Microelectronics Corp. (UMC) has adopted Synopsys Inc.'s i-Virtual Stepper system (i-VSS) for photomask inspection qualification.
2008-06-12 Takumi teams up with quality design group
Silicon recently announced that Takumi Technology has joined the Design-for-Manufacturability Coalition, which will build on previous efforts to ensure that ICs can be manufactured according to the original design intent.
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