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2008-02-06 Will EUV litho ever cross over from R&D to production
The procurement of an R&D EUV lithography tool from Nikon has reportedly been put off by Intel, raising more questions about the viability of EUV for mass chip production
2009-06-16 Intel, TSMC to tap ASML's EUV litho tool
Hynix Semiconductor, IMEC, Intel, Samsung, Toshiba and possibly Taiwan Semiconductor Manufaturing Co. are the initial customers for ASML Holding NV's "pre-production" extreme ultraviolet (EUV) lithography tool.
2011-02-07 First EUV tool ships amid power, tech concerns
ASML may have shipped the world's first EUV lithography tool, but experts insist EUV is not yet ready
2009-02-26 Firms gear for EUV litho despite tool delay
ASML Holding NV has slightly delayed the delivery schedule for its "pre-production" extreme ultraviolet (EUV) lithography tool by a quarter or so.
2010-06-14 Will EUV litho be ready for 22nm
EUV is creeping closer to the technical specifications that would allow high volume manufacturing but it now looks unlikely to arrive in time to take much part in the 22nm node
2007-10-08 Toshiba mulls over 450mm fab, EUV litho
Aiming to maintain its edge in the IC market, Japan's Toshiba Corp. is exploring several new chip-production technologies, including 450-mm fabs and EUV lithography
2015-03-25 Semicon manufacturing welcomes EUV lithography progress
The recent SPIE Advanced Lithography conference showcased a number of headway in extreme ultraviolet lithography that could possibly redefine how the process is being conducted
2007-02-28 Nikon to ship EUV tools to Intel, Selete
Nikon outlined its roadmap in the EUV lithography arena and disclosed plans to ship two prototype tools by year's end to Intel Corp. and Selete
2009-05-21 Nikon denies EUV litho program delay
Responding to an analyst, Nikon Corp. stated that its extreme ultraviolet (EUV) lithography program is still alive and well
2003-09-04 Japan plays catch-up on EUV lithography
A consortium of nine Japanese companies working on extreme-ultraviolet lithography says it is making steady progress toward a spring 2006 target for fielding an alpha tool that would provide 10W of EUV output power.
2009-06-25 Intel: Fab tool market savior
Intel Corp. continues to fund technologies and procure fab-equipment, but behind the scenes, the company is investing in some companies and brokering deals for others, reportedly including ASM International NV and NuFlare Technology Inc., sources said.
2009-02-25 Intel: EUV litho roadblocks ahead
A top technologist at Intel Corp. warned that a lack of mask inspection gear for extreme ultraviolet (EUV) lithography is threatening the process' future viability in the market
2007-06-25 Intel drafts inverse litho to cover EUV delay
With the possible delay of its EUV lithography, Intel disclosed it is developing a DFM technology that could extend optical scanners to the 22nm node
2011-07-14 Imec, SUSS MicroTec to develop EUV mask tech
Imec and SUSS MicroTec are expanding their research partnership to develop an in-fab approach to EUV lithography focusing on mask integrity
2007-10-19 IMEC, ASML expand EUV litho ties
IMEC and ASML Holding NV have has expanded their partnership on the EUV lithography front
2009-07-22 Fab tool collaboration: Mission impossible
Will the day come when rival fab tool vendors will throw out the rule book and collaborate with each other on new equipment R&D projectsjust to help the industry keep pace on Moore's Law
2011-03-04 EUV still hounded by power source issues
Leading chipmakers stress that EUV tools need 200W of power to process 100 to 150 wafers an hour. The currently used EUV tool from ASML is however running at just about 10W
2006-11-20 EUV making slow progress, reports Intel
An Intel Corp. technologist disclosed that extreme ultraviolet (EUV) lithography is making little progress, prompting the firm to look at the deployment of immersion technology at its 32nm node
2011-03-03 EUV late for 10nm party, says Intel
Although it is late for the 10nm design rule definition stage at Intel,
2008-07-22 EUV delays drive shift to double-patterning
With the probable delays for EUV lithography, ASML, Canon and Nikon are racing each other to capitalize on the shift towards double-patterning technology at the 32nm node and beyond
2010-02-26 EUV delay forces tool makers to check other options
EUV lithography is delayed again and is now targeted for chip production at the 16nm half-pitch node, leaving the industry to face the dreaded double-patterning or some variation of the technology
2003-02-19 EUV activity shifts to Sematech North
Developers of EUV lithography are looking north, specifically to the University at Albany, State University of New York, for their future
2011-01-21 Does the fab tool business model need mending
Fewer fabs coupled with cyclical downturns have caused massive consolidation in the fab tool industry. While some insist the industry should further consolidate to make it more efficient, others fear that fewer players could lead to higher tool costs and monopolies
2012-10-19 ASML pumps up EUV initiative with Cymer purchase
ASML is looking to enhance is extreme ultraviolet lithography system by buying longtime supplier Cymer
2009-10-12 ASML details EUV lithograpohy roadmap
ASML showed a rough road map for extreme ultraviolet (EUV) lithography systems that could be ready for commercial use in late 2012
2010-01-25 450mm, EUV, TSVs suffer further delays
IC Insights sees more delays for two emerging and key IC manufacturing technologies: 450mm and extreme ultraviolet (EUV) lithography
2010-06-02 Survey finds more in favor of193nm, EUV litho
A survey of more than 130 attendees hailed 193nm and EUV as the technologies that would be considered for manufacturing at the 32nm node or beyond
2012-08-29 Samsung to invest $345.5 million in Lithography dev't
Samsung joins Intel Corp. and Taiwan Semiconductor Manufacturing Co. Ltd. in investing in ASML to support the development of next generation EUV and 450-mm lithography tools
2010-04-07 Quest for the right road to lithography
The industry has long known that without a viable NGL solutionwhich most assumed would be EUVMoore's Law scaling would slow and the secular growth rate of the IC industry would decline
2004-08-05 Intel unveils EUV micro-exposure tool
Intel Corp. has installed an extreme ultraviolet (EUV) micro-exposure tool (MET) from Exitech Ltd at its development fab in Sta. Clara, California
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