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2010-01-14 Exec lists roadblocks to fab tool recovery
At SEMI's Industry Strategy Symposium (ISS), Norm Armour, VP and general manager for Fab 2 at foundry upstart GlobalFoundries Inc. listed some challenges for tool vendors
2009-06-15 TSMC weighs in on e-beam, EUV litho
Foundry giant Taiwan Semiconductor Manufacturing Co. Ltd is still backing two horses in the race to the next lithography extreme ultraviolet lithography (EUVL) and clustered electron-beam
2004-07-09 Sematech to open R&D center for immersion lithography
International Sematech on Tuesday (July 6, 2004) announced the formation of an R&D center to develop and push immersion lithography into the marketplace
2002-04-24 Intel orders scanner to develop commercial EUV lithography
Intel Corp. has ordered a beta-stage extreme ultraviolet lithography scanner from ASM Lithography to help it prepare for production of 45nm linewidth ICs using commercial EUV tools later this decade
2014-08-05 Industry analyst sceptical on IBM EUV results
IBM announced this week that the ASML NXE3300B scanner installed at its facility in Albany, N.Y., produced 637 wafers in 24 hours at a steady rate of 34 wafers/hour with a light source delivering 44W.
2016-01-25 Improvement in light source could speed up EUV progress
Prototype systems in commercial fabs now use an 85W light source, soon to be upgraded to 125W, while ASML recently demoed an 185W capability and promises it will hit 250W before the end of the year.
2008-01-23 IMEC, U.S. university partner on EUV litho research
EUV litho experiments will be carried out in collaboration by IMEC and the College of Nanoscale Science and Engineering of the University at Albany as a means to accelerate the introduction of the process in manufacturing
2015-08-28 EUV reaches angstrom resolution
The angstrom-level resolution of a new type of microscope uses femtosecond pulses of extreme ultraviolet light (EUV), the same wavelength light to be used for sub-10nm semiconductor lithography
2010-04-08 EUV metrology tool costs blow up
Sematech researcher Bryan Rice confessed that the industry still does not have the necessary inspection tools for EUVs, despite an R&D effort that has stretched over decades.
2005-10-18 ASML's EUVL alpha tool shipments slip to Q2
European lithography equipment vendor ASML Holdings NV now expects to ship its two alpha extreme ultraviolet lithography (EUVL) tools in the second quarter of 2006, the company said. This is a change from previous expectations that the tools would ship in the first quarter
2014-01-16 Imec modelling tool estimates cost of chip technology nodes
Imec and AlixPartners are co-developing a cost modelling solution to assess the cost of advanced semiconductor technology options. This modelling will assess the cost of various patterning options for N10/N7 nodes, advanced packaging solutions, and 3D NAND memory.
2009-06-08 ASML details EUV litho production plan
ASML Holding NV has tipped the roadmap for the introduction of its first extreme ultraviolet (EUV) lithography machines at the IMEC Technology Forum
2009-04-28 First' 22nm SRAM cells from EUV litho debut
IMEC has presented what it claims is to be the first functional 22nm CMOS SRAM cells made using extreme UV (EUV) lithography. The SRAM cells are made with FinFETs and have both the contact and metal-1 layer printed using a full-field EUV alpha demo tool from ASML
2010-04-15 TSMC skips 22nm, leaps to 20nm half-node
Taiwan Semiconductor Manufacturing Co. Ltd announced plans to skip the 22nm "full node" after the 28nm node and move directly to the 20nm "half node."
2012-04-20 TSMC shifts from multiple to single-only process at 20nm
Shang-yi Chiang, EVP at TSMC, said the firm might also offer an 18nm or 16nm process node after 20nm if lithography technology is not available to make 14-nm devices cost effectively
2008-03-31 Sematech forum to tackle transition to 22nm
The Sematech consortium is planning to host a three-day lithography forum May 12-14 because it is concerned about the growing uncertainty on the approach manufacturers and suppliers should take to transition from the 32nm to the 22nm half-pitch technology node
2009-11-25 Sematech expands, muses fabless push
Sematech is looking at ways to bring fabless companies into the fold and is hoping to expand its collaborative efforts with fab tool makers
2003-09-11 Researchers reflect on maskless lithos
An invitation-only workshop has kicked off last September 8, to explore a form of maskless lithography based on arrays of micromirrors
2014-12-15 Probing the macroeconomics side of Moore's Law
The author believes that the entire economic structure that was supposed to lead to next-generation manufacturing technologies like 450mm wafers and EUV lithography is on the verge of coming apart
2010-03-01 Nikon updates litho roadmap
Nikon outlined its lithography roadmap and devised a new lens for its latest 193nm immersion scanner and revised its roadmap for extreme ultraviolet (EUV) lithography
2010-06-25 Nikon stays optimistic amid losses
Nikon formulated a three-year medium term management plan that will run from fiscal 2011 to 2013. One of the goals is to bring the fab tool business back in the black
2010-03-03 Nanoimprint still awaits takeoff in HDDs
While nanoimprint has not cracked mainstream production in semiconductor fabs, as some had hoped at one time, the technology has been delayed in perhaps its biggest potential market: HDDs.
2010-03-11 Long road still to e-beam direct-write litho
While multiple development efforts on e-beam direct-write lithography have reported progress, a one prominent lithography researcher claims production tools are still a minimum of five years away
2007-04-16 Litho woes weigh down semicon industry
The lithography world has suddenly turned upside-down as the industry gets socked by a double whammy: The window of opportunity is slowly closing on EUV lithography for IC production, but the most likely alternativea version of 193nm immersionis proving expensive
2009-06-23 Intel scales down 193nm litho to 15nm
Intel claims that it has pushed 193nm immersion lithography down to 15nmat least in the lab
2012-07-11 Intel purchases ASML shares to dev't 450mm wafer
Intel has agreed to take a 15 percent stake in ASML Holding NV to accelerate the development of 450mm wafers and extreme ultraviolet lithography
2014-09-12 Intel plans to extend Moore's Law to 7nm
Chipmakers generally don't expect the much-delayed extreme ultraviolet lithography in time for 10nm chips, but many still hold out hopes it could be ready for a 7nm generation
2003-05-28 Intel drops 157 litho from roadmap
Intel dropped a bomb on the lithography industry when it said it has removed the 157nm lithography generation from its tech roadmap
2012-02-14 Imec rolls 300mm directed self-assembly process line
The fab-compatible patterning solution can pave the way for scaling EUV lithography to production level, pushing the boundaries of 193nm tech
2007-02-27 IBM pushes for immersion at 22nm
IBM outlined last week its lithography roadmap, saying that it would extend 193nm immersion lithography down to the 22nm node for logic production
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