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extreme ultraviolet What is Extreme Ultra-Violet radiation (EUV)? Search results

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What is Extreme Ultra-Violet radiation (EUV)?
Extreme Ultra-Violet (EUV) radiation is generally considered to be the part of the electromagnetic spectrum spanning from 120nm down to 10nm. Its main uses are photoelectron spectroscopy, solar imaging and lithography.
Extreme ultraviolet lithography (EUVL) is a next-generation lithography technology using the 13.5nm EUV wavelength.
total search195 articles
2013-10-09 Researchers unravel new source of extreme UV light
Scientists blasted a 30?m droplet of tin with a high-powered laser 6,000 times a second and found that 30 per cent of the EUV emission came from behind the part of the droplet that was struck by the laser.
2005-07-08 Intel, Corning codevelop ultraviolet photomask substrates
Intel Corp. and Corning Inc. have entered into an agreement to develop ultra low thermal expansion ULE glass photomask substrates required for Extreme Ultraviolet (EUV) lithography technology.
2008-02-06 Will EUV litho ever cross over from R&D to production?
The procurement of an R&D EUV lithography tool from Nikon has reportedly been put off by Intel, raising more questions about the viability of EUV for mass chip production.
2010-06-14 Will EUV litho be ready for 22nm?
EUV is creeping closer to the technical specifications that would allow high volume manufacturing but it now looks unlikely to arrive in time to take much part in the 22nm node.
2009-06-15 TSMC weighs in on e-beam, EUV litho
Foundry giant Taiwan Semiconductor Manufacturing Co. Ltd is still backing two horses in the race to the next lithography! extreme ultraviolet lithography (EUVL) and clustered electron-beam.
2015-07-08 Trends, challenges for EUV lithography
Imec said cutting costs per transistor at the next-generation, the 10nm node, will be tricky, and even more challenging will be getting extreme ultraviolet lithography ready to enable a full 7nm node.
2010-06-02 Survey finds more in favor of193nm, EUV litho
A survey of more than 130 attendees hailed 193nm and EUV as the technologies that would be considered for manufacturing at the 32nm node or beyond.
2010-06-28 Stanford top engineer weighs in on CMOS outlook
EE Times recently sat down with James Plummer, dean of Stanford's school of engineering, for a wide ranging interview on the outlook for CMOS, engineering, education and globalization.
2010-03-02 SPIE Litho wraps with delays, double-patterning
The themes of this year's SPIE Advanced Lithography event were clear: D and D!delays and double-patterning. Indeed, EUV is delayed. So is maskless. And nanoimprint is still stuck in R&D.
2010-06-08 Sematech, AZ work on EUV resist issues
AZ Electronic Materials has joined Sematech's Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.
2008-08-14 Sematech reports progress on EUV litho for 22nm
Sematech has disclosed a way of using extreme ultraviolet (EUV) lithography to define silicon devices with a half-pitch resolution as small as 22nm.
2010-02-23 Samsung to push EUV litho by 2012
Samsung Electronics Co. Ltd announced its plans to push wants extreme ultraviolet (EUV) lithography by 2012 despite signs that the technology will not be ready by that time at the LithoVision 2010.
2012-08-29 Samsung to invest $345.5 million in Lithography dev't
Samsung joins Intel Corp. and Taiwan Semiconductor Manufacturing Co. Ltd. in investing in ASML to support the development of next generation EUV and 450-mm lithography tools.
2003-01-08 Researchers improve tabletop EUV laser system
Researchers at the University of Colorado have boosted the output power and reduced the beam wavelength of their tabletop extreme ultraviolet laser system built with off-the-shelf components without altering its $5,000 cost.
2002-05-29 R&D association targets EUV lithography laser
Ten Japanese companies have formed an R&D association to develop a high-power laser technology by 2005 for use in extreme ultraviolet (EUV) lithography systems.
2010-04-07 Quest for the right road to lithography
The industry has long known that without a viable NGL solution!which most assumed would be EUV!Moore's Law scaling would slow and the secular growth rate of the IC industry would decline.
2010-03-01 Nikon updates litho roadmap
Nikon outlined its lithography roadmap and devised a new lens for its latest 193nm immersion scanner and revised its roadmap for extreme ultraviolet (EUV) lithography.
2007-02-28 Nikon to ship EUV tools to Intel, Selete
Nikon outlined its roadmap in the EUV lithography arena and disclosed plans to ship two prototype tools by year's end to Intel Corp. and Selete.
2010-06-25 Nikon stays optimistic amid losses
Nikon formulated a three-year medium term management plan that will run from fiscal 2011 to 2013. One of the goals is to bring the fab tool business back in the black.
2009-05-21 Nikon denies EUV litho program delay
Responding to an analyst, Nikon Corp. stated that its extreme ultraviolet (EUV) lithography program is still alive and well.
2010-03-03 Nanoimprint still awaits takeoff in HDDs
While nanoimprint has not cracked mainstream production in semiconductor fabs, as some had hoped at one time, the technology has been delayed in perhaps its biggest potential market: HDDs.
2006-08-01 Lithography efforts trailing 32nm target
The chip industry is enjoying a short reprieve as immersion lithography continues Moore's Law of scaling for the next few years. But for chips with a 32nm half-pitch, lithographers are counting on either extreme ultraviolet or immersion 193nm scanners enhanced with high-index fluids.
2007-04-16 Litho woes weigh down semicon industry
The lithography world has suddenly turned upside-down as the industry gets socked by a double whammy: The window of opportunity is slowly closing on EUV lithography for IC production, but the most likely alternative!a version of 193nm immersion!is proving expensive.
2011-06-27 KLA joins Sematech's litho defect reduction program
Upon joining the Sematech program, KLA will collaborate with the consortium's engineers on such areas as defect source identification and elimination, and EUV manufacturability and extendibility.
2003-09-04 Japan plays catch-up on EUV lithography
A consortium of nine Japanese companies working on extreme-ultraviolet lithography says it is making steady progress toward a spring 2006 target for fielding an alpha tool that would provide 10W of EUV output power.
2009-06-25 Intel: Fab tool market savior?
Intel Corp. continues to fund technologies and procure fab-equipment, but behind the scenes, the company is investing in some companies and brokering deals for others, reportedly including ASM International NV and NuFlare Technology Inc., sources said.
2009-02-25 Intel: EUV litho roadblocks ahead
A top technologist at Intel Corp. warned that a lack of mask inspection gear for extreme ultraviolet (EUV) lithography is threatening the process' future viability in the market.
2009-06-16 Intel, TSMC to tap ASML's EUV litho tool
Hynix Semiconductor, IMEC, Intel, Samsung, Toshiba and possibly Taiwan Semiconductor Manufaturing Co. are the initial customers for ASML Holding NV's "pre-production" extreme ultraviolet (EUV) lithography tool.
2006-01-27 Intel invests in EUV source venture
Seeking to accelerate the development of extreme ultraviolet lithography, Intel Capital has invested in Germany's Xtreme Technologies.
2004-01-28 Intel grants Cymer $20M funding for EUV litho development
Intel Corp. has agreed to provide Cymer Inc. funding of $20 million over the next three years to accelerate development of production-worthy EUV lithography light sources.
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