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2006-11-01 Tool reduces need for immersion at 45nm
Invarium Inc. offers patterning-synthesis software promising, among other things, to limit the number of advanced layers that will require immersion at 45nm. This will allow customers to get more mileage out of existing lithography equipment
2006-09-20 Tool limits need for immersion lithography at 45nm
Invarium will roll out new patterning-synthesis software this week, promising, among other things, to limit the number of advanced layers that will require immersion at 45nm
2003-12-05 Nikon to introduce immersion scanner by 2006
Nikon Corp. said it will begin selling immersion lithography tools by 2006, joining the two other major lithography vendors, ASML and Canon
2006-07-13 Lithography vendors unveil next-gen scanners
Top lithography vendors are coming to market with next-generation immersion scanners for the 45nm node and beyond. Many will enter the arena at this week's Semicon West trade show
2004-12-07 IBM used Albany immersion tool to make power processor
IBM Corp. used a Twinscan AT:1150i lithography machine from ASML Holdings NV installed at the Albany Nanotech campus in New York state to make examples of a 64bit power processor
2010-02-26 EUV delay forces tool makers to check other options
EUV lithography is delayed again and is now targeted for chip production at the 16nm half-pitch node, leaving the industry to face the dreaded double-patterning or some variation of the technology
2005-08-16 ASML debuts hyper NA immersion
The XT1700i is ASML's answer to Nikon's efforts in the hyper numerical aperture market.
2004-07-13 TEL, IMEC team up in immersion lithography
Tokyo Electron Ltd (TEL) has collaborated with IMEC for the research of 193nm immersion lithography
2004-07-09 Sematech to open R&D center for immersion lithography
International Sematech on Tuesday (July 6, 2004) announced the formation of an R&D center to develop and push immersion lithography into the marketplace
2010-04-07 Quest for the right road to lithography
The industry has long known that without a viable NGL solutionwhich most assumed would be EUVMoore's Law scaling would slow and the secular growth rate of the IC industry would decline.
2006-02-23 Nikon ships 'first' production immersion system
Nikon Corp. has shipped what it claims to be the world's first production immersion lithography system
2012-12-19 Lithography expert still not sold on EUV
It was the end of the semiconductor roadmap for 193nm lithographythe next generation would have to go to 157nm light
2011-11-22 Issues of EUV lithography
Chip makers need EUV to be ready well in advance of when they plan to use it in volume manufacturing so they can establish chip design rules and tweak their manufacturing processes.
2013-02-08 IBM: EUV lithography not ready until 7nm node
IBM warns that EUV lithography will not be ready until the 7nm node but Globalfoundries and Samsung say they are on track to offer 14nm FinFET manufacturing by 2014
2003-07-15 IBM study finds no ill effects on lithography
Researchers confirmed that early pattern imaging at IBM Corp.'s Almaden Research Center on wafers immersed in water has performed much better than expected.
2007-02-27 IBM pushes for immersion at 22nm
IBM outlined last week its lithography roadmap, saying that it would extend 193nm immersion lithography down to the 22nm node for logic production
2011-02-07 First EUV tool ships amid power, tech concerns
ASML may have shipped the world's first EUV lithography tool, but experts insist EUV is not yet ready
2009-02-26 Firms gear for EUV litho despite tool delay
ASML Holding NV has slightly delayed the delivery schedule for its "pre-production" extreme ultraviolet (EUV) lithography tool by a quarter or so
2010-11-09 Nikon fab tool unit reports losses
Nikon has reported disappointing Q2 earnings and revised down its full year target for sales and operating profit.
2010-08-12 Fab tool makers losing steam
Economic conditions do not augur well for fab tool makers, says The Information Network. A slowdown on the front end will put the brakes on the hypergrowth the industry saw earlier in the year
2009-07-22 Fab tool collaboration: Mission impossible
Will the day come when rival fab tool vendors will throw out the rule book and collaborate with each other on new equipment R&D projectsjust to help the industry keep pace on Moore's Law
2011-01-21 Does the fab tool business model need mending
Fewer fabs coupled with cyclical downturns have caused massive consolidation in the fab tool industry. While some insist the industry should further consolidate to make it more efficient, others fear that fewer players could lead to higher tool costs and monopolies
2010-12-23 Analyst predicts fab tool changes in 2011
Here are 10 predictions about the fab tool market in 2011 culled from various reports by C.J. Muse, analyst, Barclays Capital
2003-09-11 Modeling tools aid in immersion litho quest
A German company is fielding modeling tools that can help chip makers assess the promise of immersion lithography
2011-10-13 Imec, ASML deal offers advanced litho tech
The five-year collaboration will allow ASML to install its 193nm immersion lithography tool at Imec, speeding up its work on EUV lithography.
2010-03-09 ASML, Nikon battle over Intel litho biz
ASML Holding NV and Nikon Corp. are fighting over the 22nm lithography business at Intel Corp. But one analyst said both will share the 22nm business at Intel
2012-04-03 ASML dominates litho market
ASML was responsible for 57 percent of the lithography tools shipped last year, with Nikon accounting for 28 percent and Canon 15 percent
2010-03-22 Analyst offers peak into Intel 22nm litho roadmap
Arete Research analyst at Jagadish Iyer said Intel's 22nm node will require 45 "litho layers," of which 55 percent will need immersion
2008-02-06 Will EUV litho ever cross over from R&D to production?
The procurement of an R&D EUV lithography tool from Nikon has reportedly been put off by Intel, raising more questions about the viability of EUV for mass chip production
2010-04-15 TSMC skips 22nm, leaps to 20nm half-node
Taiwan Semiconductor Manufacturing Co. Ltd announced plans to skip the 22nm "full node" after the 28nm node and move directly to the 20nm "half node."
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