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2010-06-02 Survey finds more in favor of193nm, EUV litho
A survey of more than 130 attendees hailed 193nm and EUV as the technologies that would be considered for manufacturing at the 32nm node or beyond.
2002-10-30 SMIC moves carefully towards 90nm development
Semiconductor Mfg Int. Corp. is gathering the tools it needs, including a 193nm scanner, to boost efficiency as it enters into 130nm manufacturing and prepares to begin basic development work for 90nm technology.
2003-01-21 SEMICON Korea 2003 opens in Seoul
SEMICON Korea opens its doors at Seoul's Convention and Exhibition Center.
2009-11-25 Sematech expands, muses fabless push
Sematech is looking at ways to bring fabless companies into the fold and is hoping to expand its collaborative efforts with fab tool makers,
2005-09-09 Samsung, TSMC tip breakthroughs at ISSM
At next week's International Symposium on Semiconductor Manufacturing (ISSM), Samsung, Taiwan Semiconductor Mfg Corp. and other leading-edge chip makers are expected to disclose at least some of the secrets behind their respective semiconductor manufacturing efforts.
2014-03-20 Samsung announces prod'n of 20nm-based 4Gb DDR3 memory
A key element of the latest design and manufacturing technology by Samsung is a modified double patterning and atomic layer deposition that allows for continued scaling.
2003-09-16 Redefining design for yield, manufacturability
By adopting a more design-driven approach to production, many of the yield and manufacturing issues daunting the semiconductor industry can be addressed before they even occur
2006-02-27 Platform enables real-time patterning control for 65nm node
KLA-Tencor unveiled the K-T Analyzer lithography correctables platform to accelerate and improve advanced lithography cell qualification and control
2009-05-29 Nikon plans 1,000 layoffs in fab tool unit
Nikon Corp. plans to slash 1,000 jobs within its chip-equipment unit due to the ongoing IC downturn
2009-12-15 Nikon eyes litho rebound with double-patterning
Nikon Corp. is looking to regain share, especially in the upcoming double-patterning era, according to an analyst.
2010-03-03 Nanoimprint still awaits takeoff in HDDs
While nanoimprint has not cracked mainstream production in semiconductor fabs, as some had hoped at one time, the technology has been delayed in perhaps its biggest potential market: HDDs
2005-04-18 Nanoimprint litho makes its mark at SPIE
While nanoimprint vendors made impressive claims in a recent conference in California, analysts noted that the market is in its infancy.
2011-03-07 Nano-imprint litho makes headway in IC world
Nano-imprint lithography tool vendors have achieved good defect density levels for the technology's imprint-specific defectivity, claiming that many tool platforms have shipped in the past year
2004-11-15 Matsushita buys ASML TWINSCAN tools
Matsushita Electric Ind. Co. Ltd has purchased ASML's TWINSCAN lithography system
2003-01-13 Looking at a kaleidoscope of design opportunities
Recovering from the downturn that has plagued the semiconductor industry for the past two years relies heavily on the 'pull-through' demand for electronics products from consumers.
2007-02-01 Logic chipmakers seek 32nm breakthroughs
Even as they put the finishing touches on their 45nm process technologies and tweak them for low power, leading-edge logic chipmakers are scrambling to find manufacturing breakthroughs for the 32nm node and beyond.
2009-03-06 Litho woes: R&D gap, downturn
It was a triple-whammy for lithographers at the SPIE Advanced Lithography conference as the industry continues to be plagued by an R&D gap, technology delays, and, of course, the lousy economy
2009-04-27 Litho tools propel photoresist market
The trend towards advanced 193nm deep-UV (DUV) lithography tools is affecting the product mix of photoresists consumed as well as market shares of photoresist suppliers, according to the report by The Information Network
2008-07-16 Litho options falling behind process needs
Who killed high-index lithography, and was politics the cause? These questions remain for chipmakers looking for a route to next-gen manufacturing in a shifting lithography landscape
2011-09-16 Japan's EUV litho JV welcomes foreign chip firms
To hasten the adoption of EUV lithography worldwide, EIDEC has begun collaborating with foreign chip companies
2009-06-25 Intel: Fab tool market savior?
Intel Corp. continues to fund technologies and procure fab-equipment, but behind the scenes, the company is investing in some companies and brokering deals for others, reportedly including ASM International NV and NuFlare Technology Inc., sources said
2006-01-27 Intel invests in EUV source venture
Seeking to accelerate the development of extreme ultraviolet lithography, Intel Capital has invested in Germany's Xtreme Technologies
2004-01-28 Intel grants Cymer $20M funding for EUV litho development
Intel Corp. has agreed to provide Cymer Inc. funding of $20 million over the next three years to accelerate development of production-worthy EUV lithography light sources
2003-05-28 Intel drops 157 litho from roadmap
Intel dropped a bomb on the lithography industry when it said it has removed the 157nm lithography generation from its tech roadmap
2003-06-16 Infineon moves forward on 157nm research
Infineon Technologies AG and Clariant Corp. are collaborating to develop photoresists for the 157nm technology.
2011-10-13 Imec, ASML deal offers advanced litho tech
The five-year collaboration will allow ASML to install its 193nm immersion lithography tool at Imec, speeding up its work on EUV lithography
2010-03-22 IC forecasts: What keeps analysts bullish, worried
Although the signs are positive in the chip sector this year, there are still some concerns. Here are 10 reasons to remain bullishand worriedabout 2010.
2015-07-13 IBM surpasses Intel with 7nm node tech
IBM Research claims to have perfected the extreme ultra-violet (EUV) lithography and using silicon-germanium channels for its finned field-effect transistors (FinFETs
2016-02-12 GlobalFoundries, SUNY Poly open advanced patterning centre
The $500 million, five-year programme will accelerate the introduction of EUV lithography technologies into manufacturing to expedite next generation chip technology
2014-07-02 Gigaphoton unveils world's first helium-free purge process
As a move toward advancing its "Green Innovations" environmental technologies where it intends to reduce the consumption of helium, the company does just that for ArF immersion lasers.
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