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2010-09-22 Forecast: all leading-edge designs will require e-beam
D2S Inc. CEO Aki Fujimora discusses the role of electron beam lithography in the future of semiconductor manufacturing
2009-07-22 Fab tool collaboration: Mission impossible?
Will the day come when rival fab tool vendors will throw out the rule book and collaborate with each other on new equipment R&D projectsjust to help the industry keep pace on Moore's Law
2008-11-17 Fab tech roll call: survival of the fittest
Manufacturers are rolling out 45nm ICs, with 32nm designs in the works; 22nm and even smaller devices are in R&D. But delivery of chips at 32nm and beyond won't be a cool breeze.
2010-03-24 Execs weigh in on right path for litho
Was EUV the wrong bet for the industry? If so, what should it be working on instead? And who will benefit in the long run? Litho experts and executives give their opinions on these hot questions.
2010-01-14 Exec lists roadblocks to fab tool recovery
At SEMI's Industry Strategy Symposium (ISS), Norm Armour, VP and general manager for Fab 2 at foundry upstart GlobalFoundries Inc. listed some challenges for tool vendors.
2006-02-14 Evanescent wave litho to surface at SPIE
Is a technology called evanescent wave lithography the next big thing in IC manufacturing? It's unclear, but RIT claims to have printed 26nm images based on EWL
2012-07-09 EUV light source emerges from nuclear fusion lab
Researchers from the University of Washington who have been able to produce a light source with enough power that it can be used to manufacture microchips have established a start up enterprise to bring the solution to market.
2010-02-26 EUV delay forces tool makers to check other options
EUV lithography is delayed again and is now targeted for chip production at the 16nm half-pitch node, leaving the industry to face the dreaded double-patterning or some variation of the technology
2012-09-21 EMI partnership adds SK Hynix in metrology research
The EUVL Mask Infrastructure (EMI) partnership was launched by Sematech adds SK Hynix to to bolster its attempts in tackling infrastructure gaps for EUV lithography in mask metrology
2010-03-01 eBeam Initiative welcomes GlobalFoundries, Samsung
eBeam Initiative welcomes six additional companies in its program including GlobalFoundries and Samsung Electronics.
2011-01-21 Does the fab tool business model need mending?
Fewer fabs coupled with cyclical downturns have caused massive consolidation in the fab tool industry. While some insist the industry should further consolidate to make it more efficient, others fear that fewer players could lead to higher tool costs and monopolies.
2005-10-11 Design, manufacturing worlds collide at Bacus
If there was a shred of doubt remaining about the magnitude at which IC design and manufacturing convergence is taking place, it was laid to rest last week (Oct. 3-7) at the 25th annual Bacus Photomask Technology symposium in Monterey, Calif.
2014-07-01 Chip industry to face hurdles brought by 20nm tech
Executives from two capital equipment firms said chip vendors face the challenges brought by higher costs and complexities due to tighter margins, new processes and materials at 20nm and beyond
2009-09-23 Canon litho dreams hit price roadblock
The end could be near for Canon Inc.'s lithography efforts, as the company is reportedly mulling plans to cease future, high-end scanner development, according to sources
2010-03-16 Canon litho dreams hinge on nanoimprint
An analyst believes that Canon's 'great white hope' in lithography rests with an undisclosed relationship with nanoimprint lithography vendor Molecular Imprints Inc
2010-01-08 Buzz: TSMC buys Nikon 193nm litho scanner
In a surprise move, TSMC has procured a new 193nm immersion lithography scanner from rival Nikon Corp., according to sources
2006-12-07 ASML, TEL team on advanced litho tools
Tokyo Electron and ASML Holding NV are joining forces to develop next generation R&D and manufacturing tools.
2005-10-18 ASML's EUVL alpha tool shipments slip to Q2
European lithography equipment vendor ASML Holdings NV now expects to ship its two alpha extreme ultraviolet lithography (EUVL) tools in the second quarter of 2006, the company said. This is a change from previous expectations that the tools would ship in the first quarter
2009-05-19 ASML to benefit from Nikon EUV litho delay
Nikon is said to have put on hold development of some of its extreme ultraviolet (EUV) tools, which could give ASML a huge early advantage in commercial deployments of the emerging chip making technology.
2008-12-01 ASML reveals 22nm litho road map
Company executives claim that ASML is prepared to ship its next-gen immersion lithography system next year and its EUV system by 2010
2012-04-03 ASML dominates litho market
ASML was responsible for 57 percent of the lithography tools shipped last year, with Nikon accounting for 28 percent and Canon 15 percent
2010-09-29 Are Japan litho companies on the way out?
Japanese lithography equipment makers look set to fall further behind market leader ASML Holding NV, according to analysts with investment broker Nomura
2010-01-27 Analyst: Is Moore's Law slowing down?
An analyst cited that the 450mm fabs and extreme ultraviolet (EUV) lithography delays may be a possible sign that Moore's Law is in danger of slowing down
2010-03-22 Analyst offers peak into Intel 22nm litho roadmap
Arete Research analyst at Jagadish Iyer said Intel's 22nm node will require 45 "litho layers," of which 55 percent will need immersion.
2009-11-23 10 technologies to look forward to in 2010
EE Times has compiled emerging technologies that have potential to change the electronics landscape in 2010.
2016-03-21 TSMC unveils silicon plans
TSMC will enable silicon interposers larger than 1,200mm21.5x the reticle sizeat 7nm to enable giant 2.5-D stacks of logic and memory for the next gen of Cowos- chip on wafer on substrate.
2010-07-27 Photomask merchants: behind but fighting
Photomask merchant players DNP, Photronics and Toppan may be trailing the giants technology wise, but they are still in the game.
2006-09-27 ASML to spend $300M on Taiwan R&D center, says report
ASML Holding NV is considering spending as much as $300 million to set up an R&D center in Taiwan, having rejected South Korea as a location, according to a Taipei Times report.
2002-01-09 Veeco, Photronics partner in next-generation photomasks
Veeco Instruments Inc. and Photronics Inc. have formed a strategic relationship focused on developing manufacturing technologies for fabrication of enhanced reticles and next-generation lithography masks
2006-01-11 TSMC CEO takes shots at fab-tool makers
An executive from TSMC took some surprising and subtle pot shots at the IC-equipment industry, urging vendors to improve their overall costs, lead times and productivity levels
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