Global Sources
EE Times-Asia
Stay in touch with EE Times Asia
EE Times-Asia > Advanced Search > lithography rule check

lithography rule check Search results

?
?
total search15 articles
2006-09-20 Tool limits need for immersion lithography at 45nm
Invarium will roll out new patterning-synthesis software this week, promising, among other things, to limit the number of advanced layers that will require immersion at 45nm.
2005-10-07 Speaker calls for mask design rule standard
A proliferation of mask design rules from different sources calls out for a standard
2006-01-31 Tool claims dramatic reduction in OPC closure time
Aprio introduced the Halo-Fix tool that makes available the LRC repair technology used by the company's Halo-OPC product to manufacturers using third-party LRC and OPC tool sets.
2006-11-01 Tool reduces need for immersion at 45nm
Invarium Inc. offers patterning-synthesis software promising, among other things, to limit the number of advanced layers that will require immersion at 45nm. This will allow customers to get more mileage out of existing lithography equipment
2005-05-02 Tackling physical verification below 90nm
The article reviews the key challenges of physical verification below 90nm and the methodologies needed to tackle them
2008-03-17 Succeed at 65nm design
A true DFM-aware environment accounts for process variability and lithographic effects in the context of timing, power, noise and yield at every stage of the flow. This begins with the characterization of the cell library, continues through implementation, analysis and optimization, and ends with sign-off verification.
2011-09-22 Mask correction feature speeds up IC processing
The Tachyon MB-SRAF offers an expanded imaging window that the company says improves 2x-nm designs.
2007-05-25 Fujitsu taps Mentor to improve DFM capabilities
Mentor Graphics announced that Fujitsu will use Mentor's Calibre LFD to enhance their DFM capabilities for internal product development and for external fabless customers.
2006-06-27 UMC is getting 65nm interest
According to major silicon foundry United Microelectronics Corp., it has been getting a lot of interest in 65nm designs.
2004-12-23 UMC enhances 90nm manufacturability with Synopsys AA-PSM
United Microelectronics Corp. is using Synopsys Inc.'s alternating aperture phase-shift mask (AA-PSM) technology to enhance manufacturability for its 90nm process.
2004-05-14 Synopsys enhances SiVL verification tool
Synopsys has announced enhancements to its SiVL verification tool, a silicon-versus-layout tool.
2004-11-19 Micron adopts Synopsys SiVL DFM for 90nm production
Micron Technology Inc. has chosen Synopsys Inc.'s SiVL silicon-versus-layout software to help implement its advanced DRAMs, flash memories, CMOS image sensors, and other semiconductor components.
2005-05-11 TSMC expands DFM recommendations at 90nm
Taiwan Semiconductor Mfg Co. Ltd is expanding its design-for-manufacturing recommendations for engineers working with 90nm design rules, company managers told the TSMC 2005 Technology Symposium here last week.
2012-03-29 Grasp the density requirements at 28 nm
Know how density has evolved from a back-end manufacturing issue that was of little interest to designers to a design concern that affects the layout of standard cell libraries.
2007-03-16 DFM demands holistic approach
The infrastructure required to make trade-offs among the different techniques and determine the optimal approach should be one where the actual software takes into account the implications of other DFM issues. The idea is to create a holistic approach to DFM for the design and analysis flow.
Bloggers Say

Bloggers Say

See what engineers like you are posting on our pages.

?
?
Back to Top