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2006-06-16 Wet lithography makes its way out to fabs
Strained silicon answered the call first, offering mobility enhancements to rescue chip developers from high-k gate oxide delays.
2003-07-16 Wafer coating system eyes deep-UV lithography
Dainippon Screen Mfg. Co. Ltd has released its RF3 offering that is a 300mm coating/developing system for advanced deep-UV lithography.
2006-07-18 Vistec unrolls new electron beam lithography tool
Vistec announced it has already accepted orders for the new VB300 electron beam lithography tool targeting nano-lithography e-beam direct write and next-gen mask appslications.
2010-07-20 Uncertainty marks future of advanced lithography
Industry players present in Semicon West's session on advanced lithography sparked arguments on what the future holds as complexities and costs increase.
2006-09-27 Ultratech releases new AP lithography tools
Ultratech has introduced two advanced-packaging lithography tools built on its customizable Unity Platform.
2000-11-01 Ultrafine-line lithography for next-gen apps
This technical article describes the ultrafine-line technology applied by researchers at the Georgia Institute of Technology for next-generation silicon device technology.
2011-03-14 U.S. Circuits obtains Maskless Lithography DI system
Maskless Lithography Inc. reports that U.S. Circuits Inc. has taken delivery of a direct-write imaging system at its Southern California facility.
2004-12-29 TSMC verifies 90nm chips using immersion lithography tools
Taiwan Semiconductor Mfg Co. (TSMC) said that it used immersion lithography tools to produce fully functional 90nm devices.
2004-09-22 TSMC to use 193nm immersion lithography for 12-inch wafers
Taiwan Semiconductor Mfg Corp. (TSMC) will begin producing 12-inch wafers using 193nm immersion lithography by October after adopting the process to its Fab 12.
2011-09-09 TSMC to start EUV lithography
In two weeks, TSMC will start using its first extreme ultraviolet machine.
2015-07-08 Trends, challenges for EUV lithography
Imec said cutting costs per transistor at the next-generation, the 10nm node, will be tricky, and even more challenging will be getting extreme ultraviolet lithography ready to enable a full 7nm node.
2007-10-26 Toshiba taps optical lithography in fabs
Despite the hype surrounding EUV, nanoimprint and other next-generation technologies, Toshiba is still using optical lithography in its current production fabs.
2011-01-20 Toppan-IBM photomask agreement to cover 193nm immersion lithography
Toppan Printing Co. Ltd and IBM have agreed to extend their joint photomask process development efforts involving the 14nm technology node for logic devices. The companies will now collaborate on ArF immersion lithography for the 14nm node.
2006-09-20 Tool limits need for immersion lithography at 45nm
Invarium will roll out new patterning-synthesis software this week, promising, among other things, to limit the number of advanced layers that will require immersion at 45nm.
2004-07-13 TEL, IMEC team up in immersion lithography
Tokyo Electron Ltd (TEL) has collaborated with IMEC for the research of 193nm immersion lithography.
2008-09-30 Tech groups explore co-polymer lithography
Several entities including IBM Corp. and Intel Corp. are looking into a new technology called co-polymer lithography in an effort to extend Moore's Law.
2005-04-12 SUSS' new tool replaces traditional optical lithography
SUSS MicroTec announced last week a next-generation lithography tool that will replace traditional optical lithography for the production of nano-scale devices.
2004-05-14 SUSS sets up Lithography Systems for XinTec
SUSS MicroTec AG has installed multiple lithography systems for XinTec Inc.'s production line in Taiwan.
2003-01-24 SUSS MicroTec to install lithography line at Taiwan R&D firm
SUSS MicroTec has announced that they will install a lithography line at the National Nano Device Laboratories in Taiwan.
2015-02-09 SK Hynix, Toshiba join forces for nanoimprint lithography
The companies inked a joint development deal that will allow them to successfully develop NIL by minimising risk and move up commercialisation of this technology.
2002-11-06 Shipley, Numerical Tech partner in low k1 lithography
Shipley Co. L.L.C. has established a partnership with Numerical Technologies Inc. for low k1 lithography imaging.
2002-11-20 Shipley purchases SUSS lithography equipment
SUSS MicroTec has received an order for its 200mm Mask Aligner from Shipley Co. LLC.
2015-03-25 Semicon manufacturing welcomes EUV lithography progress
The recent SPIE Advanced Lithography conference showcased a number of headway in extreme ultraviolet lithography that could possibly redefine how the process is being conducted.
2004-07-09 Sematech to open R&D center for immersion lithography
International Sematech on Tuesday (July 6, 2004) announced the formation of an R&D center to develop and push immersion lithography into the marketplace.
2012-08-29 Samsung to invest $345.5 million in Lithography dev't
Samsung joins Intel Corp. and Taiwan Semiconductor Manufacturing Co. Ltd. in investing in ASML to support the development of next generation EUV and 450-mm lithography tools.
2012-10-03 Researchers from Cornell advance lithography with LSA tech
Laser-spike annealing has the potential to shorten processing time while also improving image quality of semiconductor lithography.
2002-05-29 R&D association targets EUV lithography laser
Ten Japanese companies have formed an R&D association to develop a high-power laser technology by 2005 for use in extreme ultraviolet (EUV) lithography systems.
2010-04-07 Quest for the right road to lithography
The industry has long known that without a viable NGL solutionwhich most assumed would be EUVMoore's Law scaling would slow and the secular growth rate of the IC industry would decline.
2008-07-24 Optical lithography can cover 12nm, says MIT
Optical lithography can be extended to 12nm, according to MIT researchers who have so far demonstrated 25nm lines using a new technique called scanning beam interference lithography.
2004-02-09 NTT nanofabrication uses electron beam lithography
NTT's electron beam lithography system enables the fabrication of small three-dimensional structures.
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