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2012-02-09 Mask alignment system boasts throughput up to 220 wafers/h
The EVG620HBL claims to deliver high yield that optimizes the manufacture of high-brightness LEDs.
2002-03-22 SUSS receives multi-tool order Asian company
SUSS MicroTec AG has received a multi-tool order from Asia's F-Tech. The order consists of several SAW fabrication modules, including a microlithography cluster, metal lift-off tool, production mask aligner and production probe system.
2003-01-24 SUSS MicroTec to install lithography line at Taiwan R&D firm
SUSS MicroTec has announced that they will install a lithography line at the National Nano Device Laboratories in Taiwan.
2002-11-20 Shipley purchases SUSS lithography equipment
SUSS MicroTec has received an order for its 200mm Mask Aligner from Shipley Co. LLC.
2005-04-18 Nanoimprint litho makes its mark at SPIE
While nanoimprint vendors made impressive claims in a recent conference in California, analysts noted that the market is in its infancy.
2006-12-05 GenISys layout tool speeds MEMS design
GenISys has started sampling a flexible simulation platform for mask aligner lithography that lets them virtually model, redesign and optimize device layouts and processes in hours rather than weeks.
2004-02-04 Canon aligners have large full-field exposure
The mirror projection aligners from Canon Inc. is claimed has the world's largest full-field exposure size of 1,870-by-2,200mm.
2009-10-01 SUSS MicroTec joins ITRI 3D consortium
The Advanced Stacked-System Technology and Application Consortium will implement SUSS MicroTec's 300mm technology.
2005-03-22 Intel-funded plastic IC firm folds; assets up for sale
FlexICs Inc., a pioneer in the plastic IC market that was funded by Intel Corp. and others, has folded and will put its assets up for auction, according to officials in charge of liquidating the high-profile firm.
2007-05-04 HP licenses nanoscale technology
Hewlett-Packard announced that it is licensing a technology that could enable a more powerful fabrication of semiconductor chips.
2009-09-23 Canon litho dreams hit price roadblock
The end could be near for Canon Inc.'s lithography efforts, as the company is reportedly mulling plans to cease future, high-end scanner development, according to sources.
2014-11-12 Determine acceptable jitter level in embedded design
Learn about the nuances of clock jitter specifications, and know how to determine the acceptable level of jitter early on in the development cycle to prevent dire impact on end product release schedules.
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