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| 2009-10-27 | Sematech installs tools in 450mm prototype fab International Sematech has moved into the "test wafer generation" stage and installed the first tools in its 450mm prototype clean room, including metrology and wet-clean systems. |
| 2002-09-16 | Scatterometry-based critical dimension and profile metrology This technical article discuss how as geometries are pushed below 0.15m, critical dimensions and feature profile metrology has become key to overall control of lithography |
| 2010-08-11 | Low-cost film metrology tool rolls KLA-Tencor Corp. makes available a low-cost version of its metrology solution for measuring thickness, refractive index and stress of non-critical films at the 32nm node and beyond |
| 2010-04-08 | EUV metrology tool costs blow up Sematech researcher Bryan Rice confessed that the industry still does not have the necessary inspection tools for EUVs, despite an R&D effort that has stretched over decades |
| 2012-09-21 | EMI partnership adds SK Hynix in metrology research The EUVL Mask Infrastructure (EMI) partnership was launched by Sematech adds SK Hynix to to bolster its attempts in tackling infrastructure gaps for EUV lithography in mask metrology |
| 2011-05-04 | Process control tools lag behind fab equipment in sales The market for process control tools grew only 98 percent in 2010 compared to the whopping 143 percent market growth posted by fab equipment sales in the same year |
| 2011-04-01 | Metrology tool boasts improved modeling capability The Spectrashape dimensional metrology systems released by KLA-Tencor features AcuShape2 modeling software developed jointly with Tokyo Electron Limited |
| 2004-03-01 | Metrology must advance to support 45nm The emerging method of small-angle X-ray spectrometry and ellipsometric porosimetry are competing for acceptance as commercial porosimetry solutions. |
| 2006-02-17 | KLA-Tencor unveils latest-gen optical CD metrology system KLA-Tencor's latest-generation optical CD metrology system provides cost-effective inline CD and profile measurements of critical device structures that help enable early prediction of IC performance and yield at the 90nm and 65nm nodes |
| 2002-07-11 | KLA-Tencor enhances metrology system KLA-Tencor Corp. has introduced the Archer Analyzer software for its Archer 10 optical overlay metrology system |
| 2015-02-25 | 3D metrology expedites dev't of 3D NAND Flash, FinFETs Applied Materials claims to have uniquely solved the most pressing problems facing 3D flash chip stacks and 3D FinFETs by using high-energy electron backscattering. |
| 2005-11-14 | No growth spike seen for fab tools Semiconductor equipment vendors continue to see signs of a gradual upturn in the marketplace, but don't look for a huge growth spike in the near term&mdash--if at all. |
| 2003-01-15 | Veeco, FEI terminate merger agreement Veeco Instruments Inc. and FEI Co. have mutually decided not to pursue the merger agreement both companies entered in July 2002. |
| 2002-12-19 | Veeco, FEI reviews conditions of merger Veeco Instruments Inc. and FEI Co. have announced that they will not be able to complete their previously announced merger by December 31, 2002. |
| 2002-05-30 | Silterra Malaysia, to increase output via $107M investment Silterra Malaysia Sdn Bhd, a semiconductor-manufacturing foundry, will invest an additional $107 million in capital equipment. |
| 2003-03-12 | New center targets epitaxial technology advancement Veeco Instruments Inc. has opened a 15,000-square foot epitaxial Process Integration Center adjacent to its molecular beam epitaxy manufacturing operations in Minnesota, U.S.A. |
| 2002-09-20 | Zygo receives product development contract Zygo Corp. has signed a $29.69 million contract to develop a product utilizing metrology technology and application specific solutions for next-generation lithography tools. |
| 2014-01-27 | Software from Zeta Instruments offers 3D imaging, analysis The ZMorf Surface Imaging and Metrology software supports 3D imaging of surface topography combined with colour image overlays to speed up the identification of surface features and anomalies |
| 2012-02-10 | Semicon measurement segment tops industry growth The semiconductor metrology/inspection equipment market grew 24.8 percent last year while overall semiconductor equipment grew only 9.3 percent |
| 2005-09-09 | Samsung, TSMC tip breakthroughs at ISSM At next week's International Symposium on Semiconductor Manufacturing (ISSM), Samsung, Taiwan Semiconductor Mfg Corp. and other leading-edge chip makers are expected to disclose at least some of the secrets behind their respective semiconductor manufacturing efforts. |
| 2013-09-05 | Rudolph rolls NSX tool for IC, MEMS and LED packaging The NSX 220 is an automated macro defect inspection system that uses grey-scale image analysis to provide accurate inspection and metrology in final manufacturing applications for wafers up to 300mm in size |
| 2014-06-26 | Laser line sensors boost inspection productivity The LineScan sensors from ZEISS Industrial Metrology promise to enable reverse engineering of complex products on CONTURA, ACCURA II and PRISMO CMMs |
| 2010-09-06 | Inspection tool monitors edge profiles The metrology and inspection tool can help fabs identify potentially yield-impacting irregularities in the shape of the wafer edge profile or in the edges of films deposited on the wafer |
| 2010-10-13 | Bruker completes acquisition of Veeco's AFM, OIM lines Scientific instruments and solution supplier Bruker Corp. closed a deal to purchase Veeco Instrument Inc.'s atomic force microscopy (AFM) and the optical industrial metrology instruments businesses for $229.4 million in cash |
| 2010-12-23 | Analyst predicts fab tool changes in 2011 Here are 10 predictions about the fab tool market in 2011 culled from various reports by C.J. Muse, analyst, Barclays Capital: |
| 2007-11-08 | AMD, Qimonda, Carl Zeiss unite in nanoanalysis Advanced Micro Devices Inc., Qimonda AG and Carl Zeiss SMT are cooperating to bring future chip generations faster to volume production by improving characterization and metrology |
| 2015-04-27 | Xylon, Hexagon partner for CT-based quality control systems Hexagon Metrology and Xylon International reveal a joint development aiming to bring solutions for non-destructive testing and test data processing for applications in research and development |
| 2002-12-26 | Startup taps digital holography for wafer inspection A metrology startup is pitching the use of digital holography to peer into the narrow and deep spaces, such as contacts and trench capacitors, on semiconductor wafers |
| 2014-11-05 | Smart energy platform integrates two Cortex M4 cores The dual ARM Cortex -M4 architecture allows for integration of application layer, communications layers and metrology functions in a single device |
| 2010-03-12 | Pulse-CO oximeter takes blood analysis out of lab Few disciplines can turn the cold science of metrology into pure art as quickly as medical diagnostics. Here's a teardown of the Masimo's Radical-7 Signal Extraction Pulse-CO Oximeter |
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