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2010-02-23 Toshiba, AIST work to extend optical litho life
Toshiba and the AIST entered a joint development of a mask pattern optimizing technology that improves the accuracy of lithography for LSIs by approximately 20 percent
2007-10-26 Toshiba taps optical lithography in fabs
Despite the hype surrounding EUV, nanoimprint and other next-generation technologies, Toshiba is still using optical lithography in its current production fabs.
2011-01-20 Toppan-IBM photomask agreement to cover 193nm immersion lithography
Toppan Printing Co. Ltd and IBM have agreed to extend their joint photomask process development efforts involving the 14nm technology node for logic devices. The companies will now collaborate on ArF immersion lithography for the 14nm node
2005-04-12 SUSS' new tool replaces traditional optical lithography
SUSS MicroTec announced last week a next-generation lithography tool that will replace traditional optical lithography for the production of nano-scale devices.
2012-08-29 Samsung to invest $345.5 million in Lithography dev't
Samsung joins Intel Corp. and Taiwan Semiconductor Manufacturing Co. Ltd. in investing in ASML to support the development of next generation EUV and 450-mm lithography tools
2010-04-07 Quest for the right road to lithography
The industry has long known that without a viable NGL solutionwhich most assumed would be EUVMoore's Law scaling would slow and the secular growth rate of the IC industry would decline.
2008-07-24 Optical lithography can cover 12nm, says MIT
Optical lithography can be extended to 12nm, according to MIT researchers who have so far demonstrated 25nm lines using a new technique called scanning beam interference lithography.
2012-12-21 Nikon, IME to open lithography R&D lab in Singapore
Nikon has teamed up with A*STAR's Institute of Microelectronics for an R&D facility in Singapore that will develop advanced optical lithography technology for IC manufacturing.
2002-12-26 Nanoimprint lithography ready to make its mark
A potentially low-cost form of lithography affectionately known as
2009-06-02 Nanocrystals key to sub-32nm optical litho
Pixelligent Technologies LLC claim to have developed a nanocrystalline material that can enhance the resolution of existing photolithography equipment to below 32nm.
2003-01-21 Lithography leap creates 20nm chip features
Scientists at the University of Wisconsin have found a way to create 20nm chip feature sizes with 100nm masks, giving an unexpected leap to Moore's Law and possibly extending the life of current lithography
2006-08-01 Lithography efforts trailing 32nm target
The chip industry is enjoying a short reprieve as immersion lithography continues Moore's Law of scaling for the next few years. But for chips with a 32nm half-pitch, lithographers are counting on either extreme ultraviolet or immersion 193nm scanners enhanced with high-index fluids
2002-07-10 JMAR announces breakthrough in lithography technology
JMAR Technologies Inc. is using "Collimated Plasma Lithography" to more accurately describe its breakthrough technology for processing higher performance silicon and GaAs chips
2011-11-22 Issues of EUV lithography
Chip makers need EUV to be ready well in advance of when they plan to use it in volume manufacturing so they can establish chip design rules and tweak their manufacturing processes.
2002-07-25 Industry said to face steep lithography challenges
Many in the semiconductor industry underestimate the technical and economic challenges posed by new forms of lithography, said Phil Ware, senior fellow at Canon Inc
2014-12-03 EVG unlocks nanoimprint lithography hub for photonics apps
The Nanoimprint Lithography NILPhotonics Competence Centre aims to help customers assess the technology and equipment for nanoimprint lithography (NIL) in the field of photonics
2006-09-20 Tool limits need for immersion lithography at 45nm
Invarium will roll out new patterning-synthesis software this week, promising, among other things, to limit the number of advanced layers that will require immersion at 45nm.
2010-10-12 Synopsis moves into optical design
Synopsys Inc. has acquired Optical Research Associates in a move into new markets including displays, solid state lighting, semiconductor lithography equipment and cameras.
2002-03-13 Photonic crystals seen enabling optical circuits
German researchers have developed a technique that could be used to construct tiny photonic crystals, enabling the construction of all-optical circuits
2006-02-16 Optical modulator leaps size, power bars
Electrical engineers at the University of Texas have demonstrated what they claim is the world's smallest silicon modulator.
2004-09-20 Micron, ASML MaskTools to work on lithography
Micron Technology Inc. has formed a multi-year collaborative agreement with ASML MaskTools, a business unit of ASML Holding NV, to enhance the capability of lithography tools, Micron said
2013-03-19 Lithography friendly design for improving yield
Learn about the LFD flow and the common printability failures.
2012-12-19 Lithography expert still not sold on EUV
It was the end of the semiconductor roadmap for 193nm lithographythe next generation would have to go to 157nm light
2001-03-01 Library generators employ optical correction at cell level
This technology article discusses the enhancement of cell-based designs with the evolution of EDA.
2002-05-22 KLA-Tencor Web-based lithography speeds production
KLA-Tencor Corp. has announced the availability of the Web-based Process Window Monitor (PWM) series of lithography systems that enables tighter critical dimension control and is aimed to accelerate the volume production of sub-130nm devices
2003-09-04 Japan plays catch-up on EUV lithography
A consortium of nine Japanese companies working on extreme-ultraviolet lithography says it is making steady progress toward a spring 2006 target for fielding an alpha tool that would provide 10W of EUV output power
2004-03-02 Intel, Media Lario join forces in optical component R&D
Intel Corp. and Media Lario Int. S.A. have entered into an agreement regarding development of optical components for EUV lithography.
2003-07-15 IBM study finds no ill effects on lithography
Researchers confirmed that early pattern imaging at IBM Corp.'s Almaden Research Center on wafers immersed in water has performed much better than expected.
2015-01-05 How electro-optical circuit boards are made
Electro-optical PCBs use copper for distributing power and low-speed data, and optical paths for high-speed signals. Read this article to learn more about them
2002-08-02 Canon to integrate Asyst robot in lithography tools
Canon Inc. will incorporate Asyst Technologies Inc.'s UTX-F5500C single-arm wafer-transfer robot for its advanced step-and-scan lithography systems used in 248nm, 193nm, and 157nm wavelengths
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