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What is photolithography?

A microfabrication technique that selectively removes parts of a thin film (or the bulk of a substrate). It uses light to transfer a pattern from a photomask to a light-sensitive chemical (photoresist) on the substrate. A slew of chemical treatments then engraves the exposure pattern into the material underneath the photoresist.

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2003-11-21	Team-up focuses on photolithography processes ASML Holding NV and Dainippon Screen Mfg Co. Ltd have entered into an agreement to develop seamless litho-clustering methods.
2014-02-17	Quantum photolithography writes 1nm lines at industry speed An experiment headed by Storex CEO Eugen Pavel was conducted using a proprietary photoresist material that functions as a nanolens, enabling a very high resolution at the centre of the beam.
2006-06-08	OLED fabrication uses direct-photolithography process Researchers from Germany's University of Cologne have achieved what they say is the first high-resolution, full-color OLED display based on a direct photolithographic process.
2003-07-07	Dainippon, Nikon co-develop photolithography process Dainippon Screen has entered into a collaborative agreement with Nikon for next-gen photolithography processes.
2003-09-15	Ultratech litho steppers adopted by SAE Magnetics Ultratech has announced that SAE Magnetics Ltd has purchased multiple Ultratech NanoTech 190 lithography steppers.
2015-02-09	SK Hynix, Toshiba join forces for nanoimprint lithography The companies inked a joint development deal that will allow them to successfully develop NIL by minimising risk and move up commercialisation of this technology.
2005-03-16	PC-based tools lower barrier to MEMS Take a closer look at how low-cost PC-based tools can help hurdle the challenges in MEMS design.
2002-06-26	Nanometrics rolls out 300mm wafer inspection technology Nanometrics Inc. has launched the NanoUDI technology for 300mm wafer processing, which meets requirements for yield management.
2009-06-02	Nanocrystals key to sub-32nm optical litho Pixelligent Technologies LLC claim to have developed a nanocrystalline material that can enhance the resolution of existing photolithography equipment to below 32nm.
2004-12-16	Inkjet wiring advances 'desktop factory' goal Seiko has developed multilayer wiring boards using its inkjet printing technology to print metal wiring patterns directly onto the layers.
2003-07-15	IBM study finds no ill effects on lithography Researchers confirmed that early pattern imaging at IBM Corp.'s Almaden Research Center on wafers immersed in water has performed much better than expected.
2015-01-05	How electro-optical circuit boards are made Electro-optical PCBs use copper for distributing power and low-speed data, and optical paths for high-speed signals. Read this article to learn more about them.
2011-07-07	E-beam lithography speeds up chip production MIT researchers have demonstrated the practicability of e-beam lithography in shrinking and mass producing computer chips.
2004-10-29	Cypress SVTC sets up 200mm, 300mm lithography tool Silicon Valley Technology Center (SVTC), a division of Cypress Semiconductor Corp., has installed a 200mm and 300mm wafer photolithography tool from ASML, and is now offering 65nm silicon processing capabilities to third-party companies.
2000-02-24	Microvias in Printed Circuit Design This application note outlines the use of microvia technology in high-density circuit board design. Authors also discuss relative merits of laser and photolithography methods for microvia generation.
2005-09-05	LG develops printing process for color LCD filters South Korea-based chemical supplier LG Chem Ltd has developed a method to produce color filters used in liquid crystal displays (LCDs) that utilizes ink printing rather than photolithography, which the company claims reduces manufacturing cost and time.
2008-11-25	Epson Toyocom heralds QMEMS process Epson Toyocom reports it has perfected a semiconductor-like photolithography process called Quartz MEMS that it claims will keep it ahead in the silicon MEMS oscillator market.
2014-03-04	DSA technique pushes chip fabrication below 20nm The MIT researchers' directed self-assembly technique utilises block copolymer self-assembly that facilitates the reduction of pattern sizes in photolithography and electron-beam photolithography.
2011-02-04	Used gear supplier launches R&D foundry service Aimed at discrete manufacturers, foundries, universities and fabless design houses, the new service covers fab and testing capabilities, PVD deposition capability, metrology and processing of various metals.
2009-04-09	Unlock Micron's 50nm DRAM technology With their latest 50nm process technology, Micron Technology Inc. seems to have struck the right balance between investment in new technologies and conservative design decisions.
2007-04-11	TSMC commences 45nm process TSMC has rolled out its 45-nm process technology for foundry customers, with plans to enter production as early as September 2007.
2012-05-07	TowerJazz brings CMOS imaging fab tech to CA TowerJazz has transferred its CMOS image sensor (CIS) technology from its Israel facility to a fab in California to meet its customers' manufacturing requirements.
2005-01-17	Tokyo group makes transparent transistors manufacturable Now, a group at the Tokyo Institute of Technology claims to have solved these problems at room temperature by adding gallium and indium to ZnO, opening the gates to mass-production of transparent circuitry using industry-friendly sputtering, and at temperatures low enough for direct deposition on cheap, flexible polymers.
2002-08-23	TI uses Ultratech technology for improved wafer yield Ultratech Stepper Inc. has received an order for its latest bump stepper, the Saturn Spectrum 300e2, from Texas Instruments.
2011-02-11	Technique promises nanoscale resolution with visible light The new technique uses multiphoton absorption with photoresists to achieve nanoscale resolution with focused visible light, thus delaying or even eliminating the need to move to extreme UV light sources.
2006-09-12	Tech bonds different material-based elements without wire bonding Oki Electric Industry announced a new interconnect technology that allows bonding of different material-based device elements without using conventional wire bonding.
2011-07-21	TCNL fabs ferroelectric nanostructures on plastic Georgia Tech researchers have developed a way to fabricate nanometer-scale ferroelectric structures directly on substrates.
2007-03-19	Taiwan unveils first flexible electronics lab Taiwan's government-backed R&D organization—the Industrial Technology Research Institute (ITRI)—inaugurated on March 15 the island's first flexible electronics lab.
2009-10-01	SUSS MicroTec joins ITRI 3D consortium The Advanced Stacked-System Technology and Application Consortium will implement SUSS MicroTec's 300mm technology.
2006-04-11	Silicon film, TFTs use micro-liquid processes Seiko Epson and JSR claims to have succeeded in creating the world's first silicon film with liquid coating and inkjet patterning processes.