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Photomask What is a photomask? Search results

What is a photomask?
A photomask is an opaque image on a translucent plate that is used as a light filter to transfer an image from one device to another.
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2010-04-08 EUV metrology tool costs blow up
Sematech researcher Bryan Rice confessed that the industry still does not have the necessary inspection tools for EUVs, despite an R&D effort that has stretched over decades.
2004-11-03 Epson unveils ultra-thin 20-layer circuit board
Epson said it has succeeded in leveraging its proprietary inkjet technology to develop what the company believes is the world's first ultra-thin 20-layer circuit board.
2004-03-04 EDA CEOs predict growth, cite cost concerns
As the semiconductor business continues a slow recovery, the cost of keeping up with Moore's Law is a foremost issue on the minds of EDA customers, said EDA CEOs attending the EDA Consortium forecast panel in February 26, 2004.
2010-03-01 eBeam Initiative welcomes GlobalFoundries, Samsung
eBeam Initiative welcomes six additional companies in its program including GlobalFoundries and Samsung Electronics.
2009-07-09 Duo collaborates to push nanoimprint litho
Dai Nippon Printing and Molecular Imprints collaborate to push commercialization of nanoimprint lithography for high-volume semiconductor device manufacturing.
2009-03-04 Deconstructing source-mask optimization tech
The SPIE Advanced Lithography conference witnessed a war of words among vendors developing source mask optimization tools in hopes of extending 193nm immersion lithography to the 22nm node.
2009-10-06 D2S, Advantest partner on maskless SoCs
D2S unveils packed stencil technology that works with Advantest's e-beam direct write lithography equipment.
2008-03-06 Computational litho tools roll with Cell B.E. tech
Mentor Graphics has rolled out the Calibre nmOPC and OPCverify computational lithography tools accelerated with Cell/B.E. processor technology.
2002-06-24 Coherent to develop lasers for ISMT
Coherent Inc. has received a multi-year contract from International SEMATECH for the development of lasers used in advanced photomasks applications.
2004-03-10 Chipbond buys Ultratech packaging lithography tool
Taiwan foundry Chipbond Technology Corp. has purchased Ultratech Inc.'s Saturn Spectrum 3e advanced packaging lithography tool.
2009-02-26 Chip vendors unite for e-beam initiative
The eBeam Initiative, a multi-company effort dedicated to the advancement of e-beam direct-write technology for semiconductor prototyping and low-volume manufacturing, was formally launched at the SPIE Advanced Lithography.
2002-04-08 China's IC swagger on display in Shanghai
The huge commercial potential of China's IC market was reflected in the bustle of this year's Semicon China exhibition, where China's chip makers and government officials showcased the industry's rapid ascent from back-end operation to what many predict will become an emerging semiconductor power over the next decade.
2005-07-11 Challenges seen for seamless DFM, says expert
The semiconductor and EDA industries have poured millions of dollars to develop new and promising technologies for the emerging design-for-manufacturing (DFM) sector.
2008-08-11 Carl Zeiss beefs up chip equipment biz with purchase
Carl Zeiss has purchased Pixer Technology Ltd, an Israel-based company that creates unique yield enhancement systems for photomasks in IC production.
2004-06-11 Cadence adds DFM tools to Encounter
Cadence Design Systems Inc. said it has signed a multi-year business agreement with ASML MaskTools to co-develop design-for-manufacturing tools.
2007-07-17 Cadence acquires pattern-synthesis tech developer
Cadence Design Systems has acquired Invarium, a developer of advanced lithography-modeling and pattern-synthesis technology.
2005-03-16 CAD tools shrink small world of MEMS design
Manufacturers are leveraging microdesign technologies to develop MEMS and small devices to satisfy market demand for miniaturization.
2004-09-20 Benchmark to promote Toshiba's focus measurement tool
Toshiba Corp. will join with Benchmark Technologies Inc. to promote Toshiba's focus measurement technology through Benchmark's sales channels.
2009-03-10 Bad news for Japan tool, materials markets
The book-to-bill ratio for Japanese fab tool vendors was 0.55 for January, down from 0.70 in December, according to the Semiconductor Equipment Association of Japan.
2002-02-18 ASG develops fluoropolymer for F2 lasers
Asahi Glass Co. Ltd has developed a fluoropolymer as a photoresist base for in F2 excimer laser applications forming form fine structures in practical 250nm films.
2005-10-18 Applied exits e-beam, laser tool markets
Applied Materials Inc. is quietly exiting the electron-beam and laser pattern-generation equipment markets, ending a painful and loss-ridden period in the competitive sectors, according to industry sources.
2005-06-23 Annual ARS focuses on impact of semiconductor worldwide
In view of the 40th anniversary of Moore's law, the 11th annual Advanced Reticle Symposium (ARS) will address the state of semiconductor technology advancement and its impact not only on economic growth but also on society worldwide.
2006-11-08 90nm structured ASICs out to replace FPGAs
Seeking to displace FPGAs and other chip technologies in the marketplace, eASIC Corp. came out of its shell with a bang by unveiling a new 90nm structured ASIC line.
2009-01-22 2009: year of green FPD implementation
DisplaySearch reports that 20 percent of flat-panel display (FPD) shipments in 2008 had green features, making it the year of green FPD development, and dubs 2009 as the year of green implementation.
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