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photomasks What is a photomask? Search results

What is a photomask?
A photomask is an opaque image on a translucent plate that is used as a light filter to transfer an image from one device to another.
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2002-01-09 Veeco, Photronics partner in next-generation photomasks
Veeco Instruments Inc. and Photronics Inc. have formed a strategic relationship focused on developing manufacturing technologies for fabrication of enhanced reticles and next-generation lithography masks.
2006-07-12 Toppan Photomasks to expand Shanghai facility
Toppan Photomasks plans to expand its photomask production plant in Shanghai, adding capacity to produce photomasks for 180nm ICs and additional lithography and inspection capacity for products 250nm and above.
2005-04-26 Toppan completes acquisition of DuPont Photomasks
Toppan Printing Co. has completed the roughly $650 million acquisition of DuPont Photomasks Inc.
2003-09-05 KLA-Tencor, Carl Zeiss team on 90nm photomasks
KLA-Tencor and Carl Zeiss Microelectronic Systems have established an alliance to help the semiconductor industry reduce costs and speed time-to-market on next-gen photomasks.
2006-02-21 Inspection system for 65nm photomasks
KLA-Tencor unveiled the STARlight-2 inspection system for all types of photomasks, including that of the extreme resolution enhancement technique at the 65nm node and below.
2002-12-10 DuPont Photomasks push cost reduction plans
DuPont Photomasks Inc. has announced its plans aimed towards reducing costs, improving productivity, and enhance customer service.
2002-04-08 DuPont Photomasks acquires BindKey
DuPont Photomasks Inc. has acquired EDA company BindKey Technologies Inc. BindKey will operate as a wholly-owned subsidiary of DuPont.
2005-04-22 DOJ clears Toppan's acquisition of DuPont Photomasks
The U.S. Department of Justice (DOJ) has apparently cleared Toppan Printing Co. Ltd's acquisition of rival DuPont Photomasks Inc., according to documents filed in the U.S. Securities and Exchange Commission (SEC).
2004-09-17 Synopsys, Photronics form DFM collaboration
EDA software vendor Synopsys Inc. and Photronics, a photomask company, have formed a collaborative program intended to improve the manufacturability and quality of advanced photomasks and reduce design-to-photomask cycle times, Synopsys said.
2005-07-14 Sweden's photomask tool supplier extends reach in Asia
Micronic Laser Systems AB, a supplier of laser pattern generators for photomasks, has opened its Asia Technical and Applications Center in Tokyo, Japan.
2002-04-03 Schott Lithotec buys Dupont photoblanks business
Schott Lithotec USA Corp., a subsidiary of Schott Lithotec AG, has acquired the photoblanks business unit of DuPont Photomasks Inc. The deal was reported to be worth $42 million.
2007-02-12 Nikon ventures in LCD photomask sector
Entering another arena in the industry, Nikon Corp. has invested about $19 million to start production of glass substrates for LCD photomasks.
2006-09-19 Japan's DNP, Toppan battle in flat photomask market
Japan's Dai Nippon Printing Co. Ltd seeks to regain the lead over Toppan Photomasks Inc. in what is seen as a flat photomask market, according to The Information Network.
2005-05-23 IBM, Toppan sign $200 million photomask agreement
IBM Corp. and Toppan Printing Co. Ltd have signed a joint development agreement covering 45nm photomasks worth $200 million, IBM said.
2004-05-18 DuPont starts commercial production in Dresden
DuPont Photomasks Inc. has begun commercial production at what it claims as the industry's most advanced photomask production facility in Dresden, Germany.
2002-02-12 DuPont plans to upgrade Shanghai facility
DuPont Photomasks Inc. has revealed plans to upgrade its joint-venture photomask manufacturing facility in Shanghai, China. DuPont will install an advanced manufacturing line for the production of photomasks supporting 0.185m design rules.
2002-05-30 Dai Nippon, STMicro form strategic photomask alliance
Dai Nippon Printing Co. Ltd and STMicroelectronics have formed a strategic alliance on the development and supply of photomasks.
2002-06-24 Coherent to develop lasers for ISMT
Coherent Inc. has received a multi-year contract from International SEMATECH for the development of lasers used in advanced photomasks applications.
2008-08-11 Carl Zeiss beefs up chip equipment biz with purchase
Carl Zeiss has purchased Pixer Technology Ltd, an Israel-based company that creates unique yield enhancement systems for photomasks in IC production.
2002-06-10 AMD, Infineon, DuPont establish photomask facility in Germany
Construction work on the Advanced Mask Technology Center, an equally-owned venture of Advanced Micro Devices Inc. (AMD), Infineon Technologies AG, and DuPont Photomasks Inc., has begun in Dresden, Germany.
2002-10-01 X Architecture members deliver 130nm masks
X Initiative member companies Cadence Design Systems, DuPont Photomasks, and Numerical Technologies have successfully produced the first X Architecture photomask for the 130nm semiconductor process technology node.
2005-06-29 Toppan to expand semiconductor plant in Ichon
Toppan Photomasks Inc. plans to expand its Ichon, South Korea, facility.
2005-10-06 Slow move below 100 nm, mask study finds
Only 5 percent of IC photomasks are below 100 nm, but that's a two-fold increase over last year, according to a
2005-04-05 SII system for advance processes
SII NanoTechnology will release its SIR7000FIB photomask defect repair system that repairs defects on photomasks for semiconductor devices which accommodate the 65nm node.
2011-12-08 Photomask firm halts manufacturing in Singapore
Photronics has ceased production of semiconductor photomasks but will retain customer service, data preparation and photomask repel services.
2010-09-29 New photomask etcher tackles 22nm barrier
Applied Materials delivers solution for accurate photomasks at 22nm
2005-05-25 LSI Logic eliminates mask charges for entry level platform ASICs
LSI Logic Corp. added a pair of new slices to its RapidChip Integrator2 platform ASIC family that the company says provide high-volume ASIC and FPGA designers with a way to eliminate many design and development costs, including those associated with photomasks.
2005-10-04 Litho magnification ratio unlikely to change at 32 nm
Lithography photomasks are likely to continue to rely on the current standard 4X magnification and 26mm field size through the 32nm node, according to a consensus of semiconductor equipment suppliers and manufactures at a recent Sematech-sponsored workshop.
2002-10-25 ISMT, DuPont enter cross-licensing agreement
Int. SEMATECH (ISMT) and DuPont Photomasks have signed a cross-licensing agreement, combining their IP on producing test photomasks.
2003-12-02 Finex to expand photomask capacity next year
Finex Co. Ltd will expand monthly capacity of photomasks designed for 6G TFT-LCD panels and color filters.
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