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2008-07-30 UMC signs up with Sematech consortium
United Microelectronics Corp. has joined the Sematech research consortium to work on R&D for exploratory technologies on 300mm wafers, including 22nm and beyond process generations.
2005-08-03 TSMC to exit Sematech, may join IMEC
Taiwan Semiconductor Mfg Co. will give up its membership in International Sematech later this month, and is
2011-05-17 TSMC expands R&D efforts with Sematech affiliation
TSMC is now one of the core members of Sematech. This will accelerate the improvement of R&D and manufacturing solutions in leading edge technologies.
2008-07-14 Sematech: 450mm program is on track
International Sematech is moving full speed ahead with its 450mm programs, but the question is whether the industry can meet its lofty goals in building 450mm fabs by 2012.
2007-01-31 Sematech, TEL advance work on 3D interconnects
Sematech and Tokyo Electron entered into a multi-year joint development program to improve the use of 3D interconnect technology and high mobility channel materials in advanced manufacturing.
2013-08-07 Sematech, Silvaco to co-develop advanced modelling tools
The collaboration between Sematech and Silvaco will forward the development of advanced modelling tools for the next generation of semiconductors.
2010-06-08 Sematech, AZ work on EUV resist issues
AZ Electronic Materials has joined Sematech's Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.
2009-03-03 Sematech, Asahi Glass to improve EUV mask blank yield
Sematech and Asahi Glass Co. (AGC) have entered into a joint development partnership to accelerate mask blank commercialization.
2010-06-21 Sematech welcomes Qualcomm as first fabless member
Qualcomm Inc. has joined chip-making consortium Sematech to gain an edge in next-generation technology, reportedly including 3D chips.
2007-01-30 Sematech unveils solution for high-k CMOS devices
In its quest for developing dual metal gates for high-k CMOS devices, chip-making R&D consortium Sematech has demonstrated high-k/metal gate stacks to build high-performance nMOS and pMOS transistors in CMOS configuration.
2004-07-09 Sematech to open R&D center for immersion lithography
International Sematech on Tuesday (July 6, 2004) announced the formation of an R&D center to develop and push immersion lithography into the marketplace.
2007-02-09 Sematech to advance planar solution devt for 22nm
Sematech front-end engineers will combine planar CMOS approaches with new channel materials to develop transistors for the 22nm half-pitch technology generation.
2005-06-13 Sematech subsidiary tapped to manufacture transistor technology
Acorn Technologies Inc. has selected ATDF, a subsidiary of Sematech, to fabricate its XMOS proprietary metal source drain transistor technology for advanced ICs, Sematech said Thursday (June 9).
2011-11-09 Sematech starts 3D tech forum
Sematech has launched an online forum to promote the development of standards for heterogeneous 3D integration.
2003-11-25 Sematech sets up manufacturing subsidiary
International Sematech is creating a subsidiary organization that will focus on manufacturing infrastructure, methods, standards and productivity - including the shift to the next wafer size, the consortium announced.
2008-08-14 Sematech reports progress on EUV litho for 22nm
Sematech has disclosed a way of using extreme ultraviolet (EUV) lithography to define silicon devices with a half-pitch resolution as small as 22nm.
2004-07-13 Sematech R&D wafer fab becomes independent subsidiary
The Sematech consortium is transforming its R&D wafer fab and associated analytical laboratories into an independent subsidiary named Advanced Technology Development Facility Inc. (ATDF).
2008-02-29 Sematech launches nanoimprint litho program
Sematech has started a development program in nanoimprint lithography, a move that's expected to be a major boost in this arena.
2009-10-27 Sematech installs tools in 450mm prototype fab
International Sematech has moved into the "test wafer generation" stage and installed the first tools in its 450mm prototype clean room, including metrology and wet-clean systems.
2008-03-31 Sematech forum to tackle transition to 22nm
The Sematech consortium is planning to host a three-day lithography forum May 12-14 because it is concerned about the growing uncertainty on the approach manufacturers and suppliers should take to transition from the 32nm to the 22nm half-pitch technology node.
2004-09-24 Sematech fab opens its arms to non-members
International Sematech has re-engineered itself in significant ways over the past two years while sticking to its core mission of furthering the manufacturing skills of its members.
2009-11-25 Sematech expands, muses fabless push
Sematech is looking at ways to bring fabless companies into the fold and is hoping to expand its collaborative efforts with fab tool makers,
2007-07-19 Sematech doubles 450mm efforts
International Sematech has announced the launch of a new and dedicated 450mm fab R&D program.
2009-07-02 Sematech details tips for future IC scaling
IC scaling remains a challenge and to enable it, there is always brute-force lithography.
2011-12-22 Sematech details 3D IC tech hurdles
Sematech has identified heterogeneous computing, memory, imaging, smart sensor systems, communication switches and power delivery/conditioning as some of the potential future killer applications
2009-07-06 Sematech continues 450mm campaign
Despite the current downturn, International Sematech claims it continues to make progress on 450mm tool technology by announcing several new efforts in the arena.
2006-01-26 Sematech CEO tips '300mm-prime' effort
The semiconductor industry is exploring new ways to extend 300mm fabs and push out the need for 450mm plants, according to Sematech.
2005-04-05 Samsung joins Sematech's manufacturing branch
Samsung Electronics has joined the International Sematech Manufacturing Initiative (ISMI), a subsidiary of the chip consortium that concentrates on standards and productivity challenges in chip manufacturing.
2011-01-14 Nissan Chemical, Sematech join forces for EUV research
The company joined Sematech's Resist Materials and Development Center at University at Albany's College of Nanoscale Science and Engineering to cut line edge roughness and pattern collapse in images below 22nm.
2004-10-08 Matsushita joins Sematech manufacturing initiative
The Semiconductor Company of Matsushita Electric Industrial Co. Ltd has joined the International Sematech Manufacturing Initiative (ISMI) effective Friday Oct. 1, Sematech said Tuesday (Oct. 5).
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