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2011-09-22 Mask correction feature speeds up IC processing
The Tachyon MB-SRAF offers an expanded imaging window that the company says improves 2x-nm designs.
2009-03-04 Deconstructing source-mask optimization tech
The SPIE Advanced Lithography conference witnessed a war of words among vendors developing source mask optimization tools in hopes of extending 193nm immersion lithography to the 22nm node.
2008-10-16 Advanced SMO to improve 22nm fab production
Cadence has developed software optimizing custom lithographic source illumination, an innovation in its integrated source mask optimization technology family for IC manufacturing at 22nm and beyond.
2011-09-23 Double simulation tool boosts wafer quality
The TrueMask DS is a mask-wafer double simulation accelerated workstation that improves mask write-times
2010-04-15 TSMC skips 22nm, leaps to 20nm half-node
Taiwan Semiconductor Manufacturing Co. Ltd announced plans to skip the 22nm "full node" after the 28nm node and move directly to the 20nm "half node."
2011-01-24 Samsung launches 20nm technology
Designed for logic and foundry applications, Samsung's 20nm process features bulk CMOS technology, 12 metal layers, copper interconnects, ultra low-k, stressors and a high-k/metal-gate scheme.
2010-09-29 New photomask etcher tackles 22nm barrier
Applied Materials delivers solution for accurate photomasks at 22nm
2010-11-15 IBM VP says EUV not ready
Gary Patton, VP, semiconductor R&D, IBM Corp., also emphasized the importance of computational lithography, noted the lack of development of high-k and 450mm chips, and discussed technologies to extend CMOS.
2008-09-19 IBM pushes 'computational scaling' for 22nm
Amid probable delays with extreme ultraviolet (EUV) lithography, IBM Corp. plans to extend 193nm immersion and move towards what the company calls "computational scaling" technology for the 22nm node and perhaps beyond.
2008-09-25 IBM opens gates of 300mm fab
Up until recently, IBM Corp. and its secretive chip unit refused to reveal any information about its semiconductor operations.
2010-09-22 Forecast: all leading-edge designs will require e-beam
D2S Inc. CEO Aki Fujimora discusses the role of electron beam lithography in the future of semiconductor manufacturing.
2010-02-26 EUV delay forces tool makers to check other options
EUV lithography is delayed again and is now targeted for chip production at the 16nm half-pitch node, leaving the industry to face the dreaded double-patterning or some variation of the technology.
2008-10-14 Analysis: Photomask faces market slowdown
For years, there has been an impression that the photomask business model is broken.
2008-09-23 Albany NanoTech to open 22nm R&D fab
Albany NanoTech is set to open a new facility that will focus on 22nm R&D technology, post-CMOS processes and clean technology.
2009-12-08 ASML, ST accelerate 28nm deployment
ASML, Brion Technologies and STMicroelectronics are teaming up to optimize the patterning process for sub-30nm nodes.
2006-09-22 Synopsys, Nikon co-develop 45nm solutions
Synopsys and Nikon have tied up to develop and deliver advanced lithography software models and DFM-enabled lithography manufacturing solutions for 45nm and below.
2010-06-02 Survey finds more in favor of193nm, EUV litho
A survey of more than 130 attendees hailed 193nm and EUV as the technologies that would be considered for manufacturing at the 32nm node or beyond.
2009-03-19 Power management for optimal design
This article describes a holistic approach for managing and optimizing the power in a design. Effective power management involves proper understanding the application of a chip, technology selection, design techniques and methodology.
2009-03-06 Litho woes: R&D gap, downturn
It was a triple-whammy for lithographers at the SPIE Advanced Lithography conference as the industry continues to be plagued by an R&D gap, technology delays, and, of course, the lousy economy.
2005-01-06 China to invest more in 0.18?m technology
Chinese fabs have a unique opportunity to invest more in 0.18?m technology, leveraging with the best EDA technologies that are now available.
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