Global Sources
EE Times-Asia
Stay in touch with EE Times Asia
EE Times-Asia > Advanced Search > sputtering

sputtering Search results

?
?
total search50 articles
2002-08-19 Tegal to acquire sputtering equipment company
Tegal Corp. has signed a definitive agreement to acquire privately held Sputtered Films Inc.
2014-06-26 Sputtering method reduces GaN LED prod'n cost
University of Tokyo researchers developed a technology for creating GaN LEDs on glass substrate that could not only reduce manufacturing costs but also help to develop OLED light panels.
2002-12-12 DC power supply targets sputtering apps
Advanced Energy's Pinnacle 3000 dc power supply delivers an output of up to 3kW from an input of up to 400Vac.
2001-09-12 Surface characterization of semiconductor materials by AFM
This application note presents a comparison of roughness measurements by AFM (Atomic Force Microscope) and SEM (Scanning Electron Microscope) of silicon substrates bombarded and analyzed during SIMS (Secondary Ion Mass Spectrometry) experiments.
2013-01-29 Low voltage scanning electron microscopy films
Here are examples where Agilent 8500 FE-SEM provides high resolution images of sensitive organic and biological samples.
2012-03-15 Ulvac crafts new direct solder deposition processes
The process developed by Ulvac use sputtering to deposit solder, unlike conventional solder deposition which is done by evaporation or printing.
2005-01-17 Tokyo group makes transparent transistors manufacturable
Now, a group at the Tokyo Institute of Technology claims to have solved these problems at room temperature by adding gallium and indium to ZnO, opening the gates to mass-production of transparent circuitry using industry-friendly sputtering, and at temperatures low enough for direct deposition on cheap, flexible polymers.
2014-05-13 TiN-based metamaterials exhibit high photonic densities
The metamaterials comprise superlattices using TiN and a dielectric carrying the same properties as the metal. The layers are grown inside a vacuum chamber using magnetron sputtering.
2014-04-03 Solar Frontier notches up 20.9% conversion efficiency
The record achievement resulted from a CIS cell cut from a 30cmx30cm substrate produced using a sputtering-selenisation formation method.
2002-01-22 MDT to begin trial production at third ITO line
Taiwan-based Merck Display Technologies Ltd will begin trial production at its newly established in-line sputtering ITO coating facility this month.
2008-08-27 Web coating tool eases solar cell manufacturing
Veeco Instruments Inc. has introduced a line of web coating systems designed for manufacturing copper indium gallium selenide solar cells.
2008-08-14 Unidym, Samsung extend carbon nanotube partnership
Unidym Inc. and South Korea's Samsung Electronics have extended their joint development agreement for another year.
2007-03-27 UMC taps Ulvac for solar cell biz
UMC has decided to enter into the rapidly growing solar cell market, with Ulvac set to provide the firm with thin-film solar cell production facilities and technical support to get the ball rolling.
2013-11-18 Ultra-short laser deposition tech cuts materials costs
Picodeon's ColdAb technology is geared for the application of gold and platinum thin films, enabling thinner films and reducing precious metal costs.
2013-10-18 Ultra-high-res display makers switch to metal-oxide TFTs
The expensive low-temperature polysilicon process has prompted the ultra-high-res display industry to move to metal oxide TFTs.
2002-12-17 Tosoh launches two contract manufacturers
Tosoh Corp. has officially launched manufacturing operations at Tosoh TCM Inc. and Tosoh de Mexico, its contract manufacturers of high precision components.
2009-11-26 Thin-film resistor avoids sulfur contamination
Stackpole Electronics' offers the RNCP series of thin film resistors that provide twice the normal power rating compared to standard thick film technology.
2005-09-27 Strained silicon to take IEDM spotlight
With high-k dielectrics apparently delayed beyond the 45nm node, this year's International Electron Devices Meeting will focus on second-generation strained-silicon techniques as the main pathway to faster transistors.
2004-09-03 Sony unveils BD-ROM mastering system
Sony has developed a Blu-ray Disc ROM (BD-ROM) mastering system for Blu-ray Disc pre-recorded content.
2004-06-01 Samsung develops CVD wiring process for 70nm DRAM
Samsung Electronics Co. Ltd has developed a chemical vapor deposition (CVD) method for depositing aluminum interconnect in DRAMs using a 70nm manufacturing process, the company said.
2012-04-11 Resistive RAM based on silicon dioxide
Researchers have developed a resistive-switching memory device based on silicon dioxide that shows a simpler material structure compared to those using metal-oxide films.
2014-01-06 Researchers develop energy efficient thin-film heating tool
A team from Fraunhofer Institute for Mechanics of Materials created a tempering technique that, depending on the product, is up to 90 percent more energy efficient than other known techniques.
2008-02-18 Printed electronics market to hit $30.1B by 2015
Electronics products manufactured by printing technologies will reach $30.1 billion by 2015, according to a report by NanoMarkets LC.
2014-10-29 Novel process cuts cost of micro energy harvesting
Fraunhofer researchers developed a process for the economical production of piezoelectric materials that can convert mechanical vibrations into electric energy.
2006-06-15 NMM licenses TCR resistor to Ticer Technologies
Nippon Mining & Metals Co. Ltd has licensed the technology and trademark for its TCR embedded resistor product to Ticer Technologies LLC.
2010-03-03 Nanoimprint still awaits takeoff in HDDs
While nanoimprint has not cracked mainstream production in semiconductor fabs, as some had hoped at one time, the technology has been delayed in perhaps its biggest potential market: HDDs.
2014-07-17 Nano-pixels to bring flexible, high-res displays
Oxford University scientists found that phase change materials could lead to low-energy, flexible displays for applications such as 'smart' glasses, synthetic retinas and foldable screens.
2006-08-16 MRAM ushers in era of new memory tech
For the past 11 years, Saied Tehrani and the MRAM development team he directs at Freescale Semiconductor's Arizona facility have worked on a new type of IC memoryone using magnetic resistance instead of charge storage.
2006-09-05 Moser Baer to pour additional funds in PV subsidiary
Moser Baer India will be investing an additional $17 million in Moser Baer Photovoltaic Ltd, its wholly-owned subsidiary in the photovoltaic industry.
2011-11-28 MOCVD tech ups HD res in flat panels
Jusung's deposition solution uses a semiconductor oxide material that replaces the traditional amorphous silicon based active layer.
Bloggers Say

Bloggers Say

See what engineers like you are posting on our pages.

?
?
Back to Top