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What is Extreme Ultra-Violet radiation (EUV)?
Extreme Ultra-Violet (EUV) radiation is generally considered to be the part of the electromagnetic spectrum spanning from 120nm down to 10nm. Its main uses are photoelectron spectroscopy, solar imaging and lithography.
Extreme ultraviolet lithography (EUVL) is a next-generation lithography technology using the 13.5nm EUV wavelength.
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2005-07-08 Intel, Corning codevelop ultraviolet photomask substrates
Intel Corp. and Corning Inc. have entered into an agreement to develop ultra low thermal expansion ULE glass photomask substrates required for Extreme Ultraviolet (EUV) lithography technology.
2003-05-20 BivarOpto announces ultraviolet LED product groups
BivarOpto has introduced a line of ultraviolet LED devices for applications requiring narrower bandwidth performance.
2008-02-06 Will EUV litho ever cross over from R&D to production?
The procurement of an R&D EUV lithography tool from Nikon has reportedly been put off by Intel, raising more questions about the viability of EUV for mass chip production.
2010-06-14 Will EUV litho be ready for 22nm?
EUV is creeping closer to the technical specifications that would allow high volume manufacturing but it now looks unlikely to arrive in time to take much part in the 22nm node.
2006-04-26 UV sensor shrinks size, maintains performance
EMX Industries said its remote ultraviolet luminescence sensor is 87 percent smaller than previous models but still maintains long range, high resolution and ease of use.
2009-02-20 UV LEDs target medical, industrial apps
TT electronics Optek Technology has released the OUE8A Series of UV LEDs in the UV-A spectrum offered in a variety of wavelengths and housed in hermetic TO-46 metal can packages.
2013-03-14 UV LED market primed for huge 2012-2017
According to Yole Developpement, for the period from 2012 to 2017, the market volume will grow at an average rate of 43 per cent per year, with the main market drivers being curing applications.
2009-06-15 TSMC weighs in on e-beam, EUV litho
Foundry giant Taiwan Semiconductor Manufacturing Co. Ltd is still backing two horses in the race to the next lithography extreme ultraviolet lithography (EUVL) and clustered electron-beam.
2015-07-08 Trends, challenges for EUV lithography
Imec said cutting costs per transistor at the next-generation, the 10nm node, will be tricky, and even more challenging will be getting extreme ultraviolet lithography ready to enable a full 7nm node.
2010-06-02 Survey finds more in favor of193nm, EUV litho
A survey of more than 130 attendees hailed 193nm and EUV as the technologies that would be considered for manufacturing at the 32nm node or beyond.
2010-06-28 Stanford top engineer weighs in on CMOS outlook
EE Times recently sat down with James Plummer, dean of Stanford's school of engineering, for a wide ranging interview on the outlook for CMOS, engineering, education and globalization.
2010-03-02 SPIE Litho wraps with delays, double-patterning
The themes of this year's SPIE Advanced Lithography event were clear: D and Ddelays and double-patterning. Indeed, EUV is delayed. So is maskless. And nanoimprint is still stuck in R&D.
2010-06-08 Sematech, AZ work on EUV resist issues
AZ Electronic Materials has joined Sematech's Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.
2008-08-14 Sematech reports progress on EUV litho for 22nm
Sematech has disclosed a way of using extreme ultraviolet (EUV) lithography to define silicon devices with a half-pitch resolution as small as 22nm.
2003-12-04 Sandia: Output/wavelength firsts for deep-UV LEDs
Sandia National Laboratories is reporting new levels of wavelength/power output for deep-ultraviolet LEDs, which are critical to future comms apps.
2010-02-23 Samsung to push EUV litho by 2012
Samsung Electronics Co. Ltd announced its plans to push wants extreme ultraviolet (EUV) lithography by 2012 despite signs that the technology will not be ready by that time at the LithoVision 2010.
2012-08-29 Samsung to invest $345.5 million in Lithography dev't
Samsung joins Intel Corp. and Taiwan Semiconductor Manufacturing Co. Ltd. in investing in ASML to support the development of next generation EUV and 450-mm lithography tools.
2003-01-08 Researchers improve tabletop EUV laser system
Researchers at the University of Colorado have boosted the output power and reduced the beam wavelength of their tabletop extreme ultraviolet laser system built with off-the-shelf components without altering its $5,000 cost.
2006-07-06 Research team achieves UV-accelerated oxide growth
University College London has succeeded in oxidizing silicon using ultraviolet light rather than a high-temperature furnace.
2002-05-29 R&D association targets EUV lithography laser
Ten Japanese companies have formed an R&D association to develop a high-power laser technology by 2005 for use in extreme ultraviolet (EUV) lithography systems.
2010-04-07 Quest for the right road to lithography
The industry has long known that without a viable NGL solutionwhich most assumed would be EUVMoore's Law scaling would slow and the secular growth rate of the IC industry would decline.
2010-03-01 Nikon updates litho roadmap
Nikon outlined its lithography roadmap and devised a new lens for its latest 193nm immersion scanner and revised its roadmap for extreme ultraviolet (EUV) lithography.
2007-02-28 Nikon to ship EUV tools to Intel, Selete
Nikon outlined its roadmap in the EUV lithography arena and disclosed plans to ship two prototype tools by year's end to Intel Corp. and Selete.
2010-06-25 Nikon stays optimistic amid losses
Nikon formulated a three-year medium term management plan that will run from fiscal 2011 to 2013. One of the goals is to bring the fab tool business back in the black.
2009-05-21 Nikon denies EUV litho program delay
Responding to an analyst, Nikon Corp. stated that its extreme ultraviolet (EUV) lithography program is still alive and well.
2005-11-29 New LED chips from SDK
Showa Denko K.K. launched gallium-nitride-based near ultraviolet and green LED chips for use in general white lighting and backlighting of large LCD screens.
2006-08-16 New GaN sensor is sensitive to UV-A/B/C radiation
Orion Semiconductor has unveiled the OS100 Gallium Nitride ultraviolet sensor that is sensitive to UV-A, B and C radiation but completely blind to the visible spectrum.
2002-10-03 Nanosys licenses breakthrough laser technology
Nanosys Inc. has signed an agreement with The Regents of the University of California for the exclusive license of semiconductor nanowire-based nanolasers developed by the university's research team.
2010-03-03 Nanoimprint still awaits takeoff in HDDs
While nanoimprint has not cracked mainstream production in semiconductor fabs, as some had hoped at one time, the technology has been delayed in perhaps its biggest potential market: HDDs.
2003-07-18 Macnica sensor responds to UV-A, UV-B waves
Macnica Inc. has exhibited a UV sensor at the 2003 Embedded Systems Expo & Conference (ESEC) in Tokyo, Japan.
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